Diffractive Backside Structures via Nanoimprint Lithography

Hauser, Hubert; Mellor, A.; Guttowski, A.; Wellens, C.; Benick, Jan; Müller, Christoph Michael; Hermle, Martin; Bläsi, Bénédikt

doi:10.1016/j.egypro.2012.07.073

Cited by 21 publications

(12 citation statements)

References 9 publications

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“…Typically, texturing of the silicon wafer leads to increased S back due to surface enlargement and plasma damage. Recently, a solar cell structure was presented in which the diffraction grating is electrically insulated from the electrically active region [20]. This was achieved by depositing a thin layer of Al 2 O 3 on the un-textured rear side of the Si wafer by atomic layer deposition, followed by an amorphous silicon (a-Si) layer.…”

Section: Electrical Simulation Techniquementioning

confidence: 99%

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Mellor¹,

Hauser²,

Wellens³

et al. 2013

Opt. Express

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Light trapping is becoming of increasing importance in crystalline silicon solar cells as thinner wafers are used to reduce costs. In this work, we report on light trapping by rear-side diffraction gratings produced by nano-imprint lithography using interference lithography as the mastering technology. Gratings fabricated on crystalline silicon wafers are shown to provide significant absorption enhancements. Through a combination of optical measurement and simulation, it is shown that the crossed grating provides better absorption enhancement than the linear grating, and that the parasitic reflector absorption is reduced by planarizing the rear reflector, leading to an increase in the useful absorption in the silicon. Finally, electrooptical simulations are performed of solar cells employing the fabricated grating structures to estimate efficiency enhancement potential.

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Section: Electrical Simulation Techniquementioning

confidence: 99%

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Mellor¹,

Hauser²,

Wellens³

et al. 2013

Opt. Express

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show abstract

“…Using this processing scheme, linear and crossed gratings were realized on the rear of 200 μm thick monocrystalline silicon wafers [101]. The wafers had a flat front, which was coated with a silicon nitride anti-reflection coating (ARC).…”

Section: Fabrication Of Rear Side Gratings Via Interference Lithograpmentioning

confidence: 99%

Rear Side Diffractive Gratings for Silicon Wafer Solar Cells

Peters

Hauser

Bläsi

et al. 2015

Photon Management in Solar Cells

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“…7 In recent studies, the authors demonstrated for a pitch of 1 μm that crossed gratings outperform linear gratings 18 and that excellent electrical properties of a passivated planar rear can be maintained by etching the grating into an amorphous silicon layer, which is separated from the bulk by a very thin aluminum oxide layer. 19 Both works imprinted the photonic structure on an area of about 5 × 5 cm 2 on 200-μm thick monocrystalline silicon wafers.…”

Section: Rear Side Diffraction Gratingsmentioning

confidence: 99%

Development of nanoimprint processes for photovoltaic applications

Hauser

Tucher

Tokai

et al. 2015

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Due to its high resolution and applicability for large area patterning, nanoimprint lithography (NIL) is a promising technology for photovoltaic (PV) applications. However, a successful industrial application of NIL processes is only possible if large-area processing on thin, brittle, and potentially rough substrates can be achieved in a high-throughput process. The development of NIL processes using the SmartNIL technology from EV Group with a focus on PV applications is described. The authors applied this tooling to realize a honeycomb texture (8 μm period) on the front side of multicrystalline silicon solar cells, leading to an improvement in optical efficiency of 7% relative and a total efficiency gain of 0.5% absolute compared to the industrial standard texture (isotexture). On the rear side of monocrystalline silicon solar cells, the authors realized diffraction gratings to make use of light trapping effects. An absorption enhancement of up to 35% absolute at a wavelength of 1100 nm is demonstrated. Furthermore, photolithography was combined with NIL processes to introduce features for metal contacts into honeycomb master structures, which were initially realized using interference lithography. As a final application, the authors investigated the realization of very fine contact fingers with prismatic shape in order to minimize reflection losses.

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Diffractive Backside Structures via Nanoimprint Lithography

Cited by 21 publications

References 9 publications

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Rear Side Diffractive Gratings for Silicon Wafer Solar Cells

Development of nanoimprint processes for photovoltaic applications

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