1999
DOI: 10.1080/01418619908210413
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Diffusion in the B20-type phase FeSi

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Cited by 19 publications
(20 citation statements)
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“…3(b) . Diffusion measurements on MnSi have not been reported yet, but data on the isostructural FeSi suggest that diffusion in B20 compounds is extremely slow 37 . Hence, large thermal vacancy concentrations will be frozen in during cooling already at high temperatures.…”
Section: Resultsmentioning
confidence: 99%
“…3(b) . Diffusion measurements on MnSi have not been reported yet, but data on the isostructural FeSi suggest that diffusion in B20 compounds is extremely slow 37 . Hence, large thermal vacancy concentrations will be frozen in during cooling already at high temperatures.…”
Section: Resultsmentioning
confidence: 99%
“…37,38 The presence of voids closer to the Si surface implies that Si is the dominant diffusing species in this silicide film as we would expect in FeSi. 39 To further analyze the morphology of this intruded silicide film, cross-sectional transmission electron microscopy (CSTEM) samples were prepared by combined microcleavage 40 and FIB polishing methods. 41 Special attention was paid during fabrication to maintain the integrity of the silicide film by depositing a protective Pt film on the surface.…”
Section: Resultsmentioning
confidence: 99%
“…This implies a "solute dependent grain growth" according to Cahn's theory for grain growth with solute impediment [Cahn J. W., 1962], indicating that the migration of solute atoms with GBs is the rate controlling mechanism for grain growth. In the lower temperature regime of 573-703 K, the activation energy is only 31.2 kJ mol" 1 , which is much lower than the reported activation energy of 212 kJ mol" 1 for lattice diffusion of Si in microcrystalline, disordered bcc-Fe(Si) [Salamon, M., et al, 1999]. Similar small activation energies for grain growth in NC material have been observed by other researchers also [Shukla, S., 2003].…”
Section: Activation Energy For Grain Growthsupporting
confidence: 57%