PbTe, Pb0.TsSno.~sTe, and Pb0.91Sn0.09Se single crystal films were grown on BaF2(100) at 620~176 and 10 -9 Torr by coevaporation of the stoichiometric binary compounds and the dopant elements from separate sources. Molecular incident fluxes measured with a quartz crystal monitor usually agreed with those calculated from vapor pressure data to within 20%. Unintentionally doped films had carrier concentrations in the 1018-1017 cm -3 range, n and p doping were achievable by stoichiometry adjustment using coevaporated Pb and Te (or Se), respectively; but only ~0.1% of each became incorporated: the remainder surface-segregated (Pb) or reevaporated (Te,Se). Conversely, >1/2 of incident Bi and T1 became incorporated as n and p dopant, respectively, to levels >1019 cm -8, most likely by substituting for Pb or Sn and displacing it to the growth surface; except that Bi in the selenide (and Sb in both) showed less incorporation as dopant at >10 is cm -s, most likely due to compensation. Bi2Te3 behaved as Bi in the telluride and was found to sublime molecularly according to log10 P(Bi2Te3, Torr) = (1.53 • 104/T) + 16.4. SIMS depth profiling of grown abrupt dopant steps showed high-concentration diffusion coefficients of Bi and T1 in (PbSn)Te at 650~ and of T1 in (PbSn)Se at 620~ to be 9, 4, and 0.9 • 10 -25 cm2/sec, respectively; but much faster diffusion (>10 -10 em2/sec) of T1 in the selenide occurred up to 3 • 1017 T1/cm 3. Similar low-concentration fast diffusion caused carrier concentrations of undoped telluride films below layers doped with Bi or Bi2Te3 to be shifted by 3 • 1017 cm -3 toward n-type and 5 • 1017 cm -3 toward p-type, respectively; the latter and possibly also the former shift was due to equalization of dopant-perturbed stoichiometry deviation rather than to fast-diffusing Bi. Excellent junction profile control may be obtained with these impurity dopants provided that the fast-diffusing components are appropriately compensated for in junction design.The IV-VI semiconductors, particularly the ternary alloys Pbl-xSnxVI, where VI is S, Se, or Te, are valuable as phetovoltaic infrared radiation detectors and as tunable.diode lasers. This is because they have small direct bandgaps which are widely variable through the infrared photon energy range by both composition (x) and temperature tuning. Molecular beam epitaxial (MBE) growth of these compounds offers the following advantages: low temperature to minimize interdiffusion, precise definition of multilayer structures, and compositional uniformity over large areas.Like other compound semiconductors, the IV-VI compounds are single phase over a range of stoichiometry deviation from metal-rich to metal-poor, and the resulting lattice vacancies (and sometimes interstitials) act as n-type and p-type dopants, respectively. Control of ~he stoicniometry deviation by various techniques has often been used to produce p/n junctions in these materials, but this procedure is limited in both the control and the level of doping achievable when MBE is used, as will be seen be...