2003
DOI: 10.1143/jjap.42.3885
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Diluted Low Dielectric Constant Materials as Bottom Antireflective Coating Layers for both KrF and ArF Lithography Processes

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“…As one of the solutions, the application of coating a bottom antireflective coating (BARC) between the resist and the substrate has been extensively investigated in order to decrease the reflectivity from the substrate. [1][2][3][4][5] Along with the progress of resist pattern scale miniaturization, thinner resist films are being used. Additionally the need to significantly reduce the time of the BARC etch process has required BARC that show good performance at thinner thickness or that possess higher etch rates in comparison to the resists being used.…”
Section: Introductionmentioning
confidence: 99%
“…As one of the solutions, the application of coating a bottom antireflective coating (BARC) between the resist and the substrate has been extensively investigated in order to decrease the reflectivity from the substrate. [1][2][3][4][5] Along with the progress of resist pattern scale miniaturization, thinner resist films are being used. Additionally the need to significantly reduce the time of the BARC etch process has required BARC that show good performance at thinner thickness or that possess higher etch rates in comparison to the resists being used.…”
Section: Introductionmentioning
confidence: 99%