Direct detection of vacuum ultraviolet radiation through an optical sampling orifice: determination of nonmetals in gaseous samples by inductively coupled plasma atomic emission spectroscopy

Characterization of a computerized photodiode array spectrometer for gas chromatography-atomic emission spectrometry

“…For optimal sensitivity, the most sensitive atomic lines should be used for the major elements of interest. The sensitivity advantages of the vacuum ultraviolet region (vacuum UV) for elements such as C, S, and N have been reported (41)(42)(43). There has also been work in the near-infrared region (near-IR) with PDAs (22-25), as well as with interferometers (4-6).…”

Inductively coupled plasma mass spectrometry

“…These and other possibilities for spectral interferences were tabulated extensively by Vaughn, Tan,and Horlick (147,169), and computer programs to aid in identification of these interferences are available (139,170). Substantial HF in the sample, often necessary for dissolution of silicate samples, can lead to rapid degradation of the sampling orifice, presumably from attack by free F atoms in the plasma (171). Thus, acids other Background spectra for 5% nitric acid, mlz = 1 4 3 .…”

Direct introduction of cigarette smoke for puff-by-puff trace metals analysis by inductively coupled plasma mass spectrometry

“…For example, the determination of non-metals, such as Br, C, Cl, F, and S, in gaseous samples has been performed by ICP-OES. [19][20][21] Real-time monitoring and determination of trace metals for continuous on-line process control have also been applied to the polymer industry for analysis of inorganic impurities in ethene gas by ICP-MS. 22 Electronic grade gases utilized for the semiconductor manufacturing process have been introduced to sealed ICP-OES 23,24 and ICP-MS 25 instruments for ultra-trace level impurity measurements.…”