2012
DOI: 10.1016/j.mee.2012.02.049
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Direct e-beam lithography of PDMS

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Cited by 25 publications
(21 citation statements)
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“…Similarly, a previous study by Bowen et al explored the effect of e-beam exposure on the mechanical properties of uncross linked PDMS with an aim to validating PDMS as a potential e-beam resist. [31] Interestingly, this study reported very similar mechanical responses of the pre-polymer to e-beam exposure to those reported herein. Conversely, we employed direct-write focused e-beam patterning, which has not previously been explored, to produce geometrical patterns of increased rigidity on viscoelastic PDMS substrates.…”
Section: Discussionsupporting
confidence: 82%
“…Similarly, a previous study by Bowen et al explored the effect of e-beam exposure on the mechanical properties of uncross linked PDMS with an aim to validating PDMS as a potential e-beam resist. [31] Interestingly, this study reported very similar mechanical responses of the pre-polymer to e-beam exposure to those reported herein. Conversely, we employed direct-write focused e-beam patterning, which has not previously been explored, to produce geometrical patterns of increased rigidity on viscoelastic PDMS substrates.…”
Section: Discussionsupporting
confidence: 82%
“…In particular, with an increasing of radiation dose (long‐lasting or higher power O 2 plasma treatment) the hardness of the PDMS film will increase steadily, which is attributed to the increase of cross‐link density and the decrease of molecular mobility. A similar phenomenon has been reported in previous works . A higher degree of cross‐linking results in a tighter network, which is responsible for the steady increase in hardness and results in the loss of tensility of the PDMS film.…”
Section: Resultssupporting
confidence: 87%
“…There is a significant increase in the elastic modulus at the irradiated area, because of the forming SiO x species, as it was shown before [31]. Thus, as the formation of the SiO x progresses, the created micropillars are more stable.…”
Section: Resultssupporting
confidence: 55%
“…As a result, very smooth, high aspect ratio microstructures can be formed. At the irradiated areas the adhesion [30], elastic modulus [26,31] and the refractive index [32] change as well because of the ion irradiation induced chemical processes, depending on the applied ion energy and fluence. Due to these effects, functionalised microstructures with adjustable physicochemical properties can be realized with this resist material by applying certain irradiation conditions, which would be a great advance for specific applications.…”
Section: Introductionmentioning
confidence: 99%