2004
DOI: 10.1016/s0167-9317(04)00126-1
|View full text |Cite
|
Sign up to set email alerts
|

Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

Abstract: To cite this version:P. Ferrand, J. Seekamp, M. Egen, R. Zentel, S. G. Romanov, et al.. Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals. Microelectronic Engineering, Elsevier, 2004, 73-74, pp

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
8
2

Year Published

2005
2005
2015
2015

Publication Types

Select...
5
3

Relationship

0
8

Authors

Journals

citations
Cited by 21 publications
(10 citation statements)
references
References 9 publications
0
8
2
Order By: Relevance
“…We show that the size of the defects can be controlled; in particular, defects much smaller than the size of a single sphere have been fabricated. Our results thus differ from previous studies where large area modifications have been written in polymeric opal films by electron beam [87] and by laser beams [88]. We conclude that focused ion beam milling allows for much smaller or more detailed cavities than these two techniques.…”
Section: Discussioncontrasting
confidence: 99%
See 1 more Smart Citation
“…We show that the size of the defects can be controlled; in particular, defects much smaller than the size of a single sphere have been fabricated. Our results thus differ from previous studies where large area modifications have been written in polymeric opal films by electron beam [87] and by laser beams [88]. We conclude that focused ion beam milling allows for much smaller or more detailed cavities than these two techniques.…”
Section: Discussioncontrasting
confidence: 99%
“…We do not pursue such cavities because of the challenging layer-by-layer nature of the fabrication process, which induces alignment errors and consequently leads to reduced photonic strengths S and lower cavity quality factors Q. Large area modifications have been written in the surface of polymeric opal films, see for examples references [87] and [88]. It is likely that these defects are too large to confine light.…”
Section: Optical Cavities In a Three-dimensional Photonic Crystalmentioning
confidence: 99%
“…If control over the spatial position of the defects is required, a sequential fabrication technique has to be chosen, which is also typically employed for line- and plane defects. After assembly of a colloidal crystal distinct particles in the top layer can be modified by an electron beam and then selectively removed in a developer solution . The generated point defects are then integrated at defined positions into the interior of the colloidal crystal by successive growth of additional layers on top of the crystal (Figure b) .…”
Section: D Colloidal Assembliesmentioning
confidence: 99%
“…After assembly of a colloidal crystal distinct particles in the top layer can be modified by an electron beam and then selectively removed in a developer solution. 412 The generated point defects are then integrated at defined positions into the interior of the colloidal crystal by successive growth of additional layers on top of the crystal (Figure 20b). 413 Using plasma etching Ding et al modified the volume fraction of the entire top layer of a polymeric colloidal crystal to introduce a defined 2D layer defect after continued colloid crystal growth.…”
Section: Chemical Reviewsmentioning
confidence: 99%
“…Relevant and interesting methods to fabricate cavities in opal-based and inverse-opal-based photonic crystals has been reported in Refs. [34][35][36][37].…”
Section: Published By the American Physical Society Under The Terms Omentioning
confidence: 99%