2001
DOI: 10.1063/1.1372201
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Direct evidence for implanted Fe on substitutional Ga sites in GaN

Abstract: The lattice location of iron in thin-film, single-crystalline hexagonal GaN was studied by means of the emission channeling technique. Following 60-keV room-temperature implantation of the precursor isotope 59 Mn at a dose of 1.0×10 13 cm −2 and annealing up to 900°C, the angular distribution of β − particles emitted by the radioactive isotope 59 Fe was measured by a position-sensitive electron detector.

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Cited by 23 publications
(23 citation statements)
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“…11,12 Furthermore, the emission channeling technique applied to Fe-implanted (Fe dose up to 10 19 cm −3 ) GaN samples confirmed the presence of a high percentage of TM ions (up to 80%) occupying substitutional Ga sites of the host crystal. 13 Moreover, GaN films doped with Fe, with concentrations up to 3 × 10 19 cm −3 were grown by molecular beam epitaxy (MBE) at substrate tempera-tures T S ranging from 20 to 380 • C directly on sapphire (0001) and ferromagnetic behavior with a Curie temperature T C = 100 K has been observed only in the samples grown at 400 • C. 14 Films of GaN:Fe (Fe density up to 6 × 10 21 cm −3 ) fabricated by means of MBE at T S = 500 -800 • C showed a superparamagnetic behavior 15,16 assigned to Ga-Fe and/or Fe-N inclusions. Extended x-ray absorption fine structure (EXAFS) analysis suggests that the decrease of T C leads to a structural transition from the wurtzite (wz) to the zinc-blende (zb) reconstruction, and this transition may be related to the origin of ferromagnetism in Fe-doped GaN films.…”
Section: Introductionmentioning
confidence: 99%
“…11,12 Furthermore, the emission channeling technique applied to Fe-implanted (Fe dose up to 10 19 cm −3 ) GaN samples confirmed the presence of a high percentage of TM ions (up to 80%) occupying substitutional Ga sites of the host crystal. 13 Moreover, GaN films doped with Fe, with concentrations up to 3 × 10 19 cm −3 were grown by molecular beam epitaxy (MBE) at substrate tempera-tures T S ranging from 20 to 380 • C directly on sapphire (0001) and ferromagnetic behavior with a Curie temperature T C = 100 K has been observed only in the samples grown at 400 • C. 14 Films of GaN:Fe (Fe density up to 6 × 10 21 cm −3 ) fabricated by means of MBE at T S = 500 -800 • C showed a superparamagnetic behavior 15,16 assigned to Ga-Fe and/or Fe-N inclusions. Extended x-ray absorption fine structure (EXAFS) analysis suggests that the decrease of T C leads to a structural transition from the wurtzite (wz) to the zinc-blende (zb) reconstruction, and this transition may be related to the origin of ferromagnetism in Fe-doped GaN films.…”
Section: Introductionmentioning
confidence: 99%
“…Note, nonetheless, that the incorporation of Mn impurities in N sites cannot be considered a direct effect of ion implantation, since it was not observed for Fe under very similar experimental conditions. 18 Fe is a 3d transition metal as well, with an atomic mass which is similar to that of Mn and, therefore, has similar incorporation kinetics. A more detailed description of the conditions under which N substitution by Mn impurities occurs in wurtzite GaN will require the assessment of the formation energies of such defects, as well as an experimental reassessment of the lattice location of Mn in GaN for different preparation methods and growth conditions, carefully taking into consideration the possibility of anion substitution.…”
Section: Discussionmentioning
confidence: 99%
“…We have previously used the emission channeling technique to determine the lattice location of other impurities in GaN (e.g. Fe, 18 As, 19 and several rare earths 20 ). The technique is particularly suited in cases where significant fractions of the impurity atoms occupy more than one lattice site.…”
Section: Methodsmentioning
confidence: 99%
“…Further calculations on the ratio of the integrated intensity counts, done on the L 3 and L 2 absorption edge of nickel, correspond to valence state of +2. In analogy with Wahl et al's report for Fe implanted GaN [3], we expect that some fraction of Ga is substituted by Ni after implantation. Moreover, the post-implantation annealing assured the migration to the correct (cation) lattice site of most of the implanted dopant ions [4].…”
mentioning
confidence: 89%