Direct Evidence for Silver Film Deposition below Room Temperature on Pt(111) from the ((CH3)3CCOCHCOC3F7)AgPEt3 Precursor

Serghini-Monim, S.; Yuan, Zheng; Griffiths, K.; Norton, P. R.; Puddephatt, Richard J.

doi:10.1021/j100022a041

Cited by 6 publications

(12 citation statements)

References 4 publications

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“…The precursor has shown the best thermal stability during the process of volatilization and the lowest temperature for silver deposition (below room temperature) on Ag(111) and Pt(111) single crystals . Similar behavior has been observed with [(1,1,1,2,2,3,3-heptafluoro-7,7-diethyl-4,6-octanedionato)(triethylphosphine)silver(I)], [(fod)Ag(PEt 3 )]. , These fod complexes have not been structurally characterized, but all spectroscopic data indicate that they contain 3-coordinate silver(I) as proved crystallographically for the closely related complex [CF 3 COCHCOCF 3 )Ag(PEt 3 )] …”

Section: Introductionsupporting

confidence: 70%

“…The absence of a CO vibrational band at 1639 cm -1 in the spectrum at 340 K is probably due to partial dissociation of the (fod)−Ag bond or to the orientation of the [fod] ligand with its carbonyl groups parallel to the surface. Studies of the adsorption of [fodH] and [(fod)Ag(PMe 3 )] on metal surfaces have shown that the first adsorbed states of these molecules are characterized by having their molecular plane parallel to the surface. − …”

Section: Resultsmentioning

confidence: 99%

“…The experiments were performed in two separate UHV chambers. Reflection−absorption infrared measurements were performed in the UHV chamber (base pressure <5 × 10 -9 Torr, mainly water) described previously, , the only difference being that the coldfinger is terminated with a sample holder that can accommodate interchangeable aluminum disks of 14 mm diameter. A wobble stick was used to interchange samples that were held on a carousel.…”

Section: Methodsmentioning

confidence: 99%

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Adsorption of a Silver Chemical Vapor Deposition Precursor on Polyurethane and Reduction of the Adsorbate to Silver Using Formaldehyde

et al. 1998

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The interaction of the silver chemical vapor deposition precursor (1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedionato)(trimethylphosphine)silver(I), [(fod)AgP(CH3)3], with a polyurethane surface has been investigated with reflection−absorption infrared spectroscopy (RAIRS), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The RAIR spectra show a decrease of the intensity of both polyurethane CO and N−H vibrational bands at 90, 300, and 340 K. This suggests that a specific interaction occurs between [(fod)Ag(PMe3)] and polyurethane carbonyl groups at the surface, leading to the displacement of [P(CH3)3]. After exposure of polyurethane to the Ag complex at room temperature and above, XPS shows the presence only of Ag, F, and O, indicating displacement of [P(CH3)3] groups. The exposure of the adsorbed (fod)Ag−polyurethane complex to formaldehyde [HCHO] leads to additional deposition of silver and to the formation and the desorption of [1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedione], [fodH], from the polyurethane surface. AFM indicates that the silver is present in the form of clusters. Taken together, these data demonstrate the feasibility of low-temperature CVD of silver on organic polymer substrates.

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Section: Introductionsupporting

confidence: 70%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Adsorption of a Silver Chemical Vapor Deposition Precursor on Polyurethane and Reduction of the Adsorbate to Silver Using Formaldehyde

et al. 1998

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“…The results of the surface reaction of (fod)AgPEt3 on Pt(lll) are given elsewhere. 33 RAIRS Results of the Adsorption of (fod)AgPEt3 on Ag(lll). As in the case of the fodH/Ag(lll) system at low exposure, the RAIR spectra obtained at low doses of (fod)-AgPEt3 do not show any features near 1600 cm-1.…”

Section: Resultsmentioning

confidence: 99%

Low-Temperature Chemical Vapor Deposition of Silver on Ag(111) Using ((CH3)3CCOCHCOC3F7)AgPEt3

Serghini-Monim¹,

Yuan²,

Griffiths³

et al. 1995

J. Am. Chem. Soc.

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“…The RAIRS measurements were performed in the UHV chamber (base pressure < 5 × 10 -9 Torr) described previously , with the only difference being that the cold finger is terminated with a sample holder which can accommodate interchangeable polished aluminum disks of 14 mm diameter. A wobble stick was used to interchange samples which were held on a carrousel.…”

Section: Methodsmentioning

confidence: 99%

Chemical Vapor Deposition of Silver on Plasma-Modified Polyurethane Surfaces

1997

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The surface chemistry of [(1,1,1,2,2,3,3-heptafluoro-7,7-dimethyl-4,6-octanedionato)(trimethylphosphine)silver(I)], [(fod)AgP(CH 3 ) 3 ], a silver precursor for chemical vapor deposition (CVD), has been investigated on plasma-modified polyurethane surfaces by means of reflection−absorption infrared spectroscopy (RAIRS) and X-ray photoelectron spectroscopy (XPS). On the unmodified polyurethane surface, the RAIRS and XPS data show that [(fod)Ag(P(CH 3 ) 3 )] reacts with polyurethane CO, N−H, and C−O−C groups present at the surface by displacing the Lewis base P(CH 3 ) 3 ; these acid−base reactions yield the formation of surface Ag−O and Ag−N bonds. Air plasma treament of the polyurethane surface leads to the incorporation of CO and C−O−O functional groups, as well as the conversion of C−N(H)− into CN− functional groups by the abstraction of hydrogen. RAIRS data obtained following O2 and air plasma treatment showed that, in addition to grafting of functional groups, polyurethane chains change their conformation in the polyurethane film. The increase of silver concentration resulting from CVD is proportional to the increase of oxygen incorporated on the polymer surface. This study shows that CVD on soft polymers can be performed at room temperature.

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Direct Evidence for Silver Film Deposition below Room Temperature on Pt(111) from the ((CH3)3CCOCHCOC3F7)AgPEt3 Precursor

Cited by 6 publications

References 4 publications

Adsorption of a Silver Chemical Vapor Deposition Precursor on Polyurethane and Reduction of the Adsorbate to Silver Using Formaldehyde

Adsorption of a Silver Chemical Vapor Deposition Precursor on Polyurethane and Reduction of the Adsorbate to Silver Using Formaldehyde

Low-Temperature Chemical Vapor Deposition of Silver on Ag(111) Using ((CH3)3CCOCHCOC3F7)AgPEt3

Chemical Vapor Deposition of Silver on Plasma-Modified Polyurethane Surfaces

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