Direct fabrication of pixelated detector arrays for high-energy x-ray imaging via additive manufacturing

Abstract

Pixelated arrays of the transparent ceramic (Gd,Lu)2O3:Eu (GLO) scintillator for x-ray imaging have been fabricated using direct ink write (DIW) additive manufacturing followed by sintering and ceramics processing steps. These arrays consist of ~400 µm diameter pixels that are 4 mm long and have a pitch of 500 µm. When mounted on an amorphous silicon xray imaging array, pixelated GLO arrays offer >10x increase in the light output compared to black-coated monolithic GLO plates, using a 150 keV Bremsstrahlung source.