Graphene direct growth
was performed on an a-plane (1–120) sapphire substrate using
low-pressure chemical vapor deposition (LPCVD) without a metal catalyst.
The direct graphene growth on a-plane sapphire is very attractive
not only for the preparation of a template substrate of remote epitaxy
but also for the fabrication of low-cost graphene-based electronic
devices. The growth pressure dependence was systematically studied
to reveal the growth mechanism of graphene. It was found that the
graphene island density decreased with growth pressure, while the
growth rate increased. In addition, single-layer graphene with high
uniformity was successfully obtained because the graphene growth was
driven by the catalytic effect of the a-plane sapphire surface. Finally,
high-quality and highly uniform single-layer graphene with a Raman
D/G ratio of 0.2 was demonstrated on the whole surface of a 2 in.
a-plane sapphire substrate at a growth pressure of 5 kPa.