Direct laser patterning of ruthenium below the optical diffraction limit
Lorenzo Cruciani,
Marnix Vreugdenhil,
Stefan van Vliet
et al.
Abstract:We describe a method that can be used to produce ruthenium/ruthenium oxide patterns starting from a ruthenium thin film. The method is based on highly localized oxidation of a small surface area of a ruthenium film by means of exposure to a pulsed laser under ambient conditions. Laser exposure is followed by dissolution of the un-exposed ruthenium in a NaClO solution, which leaves the conductive, partially oxidized ruthenium area on the substrate. Spatially selective oxidation, material removal, and, by implic… Show more
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