The development of novel in situ/operando spectroscopic tools has provided the opportunity for a molecular level understanding of solid/liquid interfaces. Ambient pressure photoelectron spectroscopy using hard X-rays is an excellent interface characterization tool, due to its ability to interrogate simultaneously the chemical composition and built-in electrical potentials, in situ. In this work, we briefly describe the "dip and pull" method, which is currently used as a way to investigate in situ solid/liquid interfaces. By simulating photoelectron intensities from a functionalized TiO 2 surface buried by a nanometric-thin layer of water, we obtain the optimal photon energy range that provides the greatest sensitivity to the interface. We also study the evolution of the functionalized TiO 2 surface chemical composition and correlated band-bending with a change in the electrolyte pH from 7 to 14. Our results provide general information about the optimal experimental conditions for characterizing the solid/liquid interface using the "dip and pull" method, and the unique possibilities offered by this technique.Surfaces 2019, 2 79 perturbation of the junction itself. Therefore, several spectroscopic methods based on photon in/photon out or photon in/electron out approaches have been applied to investigate solid/liquid interfaces. Among them, synchrotron-based techniques such as surface X-ray diffraction, X-ray absorption/emission and photoelectron spectroscopy, and "laboratory-based" techniques, such as infrared, Raman and non-linear optical spectroscopies have been recently developed [10].In this context, X-ray photoelectron spectroscopy (XPS) stands as an excellent characterization tool, since it offers elemental and chemical sensitivity, simultaneously measuring local built-in electrical potentials via the detection of rigid photoelectron kinetic energy shifts in both core and valence levels [11][12][13][14][15][16][17]. Due to the high vapor pressure of many liquids of interest, differential pumping schemes have to be used in photoelectron analyzers to minimize the elastic and inelastic scattering of electrons in the gas phase above the liquid side of the junction [18][19][20]. In addition, small sample-to-analyzer aperture working distances (WDs) must be used, for the same purpose [18][19][20]. A reasonable trade-off needs to be found between limiting the electron scattering by the gas phase molecules and keeping the pressure at the sample surface above 90-95% of the nominal pressure in the chamber. Usual WDs (at which the analyzer focus is optimized) are about the diameter of the aperture itself [18][19][20]. Modern state-of-the-art electron analyzers are capable to operate at pressures of and above 30 mbar (the vapor tension of water at room temperature) and at high photoelectron kinetic energies (KEs, up to 12 keV) [11]. The extension of AP-XPS to high photon energies (i.e., high photoelectron KEs) has two main advantages: the reduced photoelectrons/gas molecules scattering provides higher signal intensity at...