Direct Nanolithography of Organic Polysilane Films Using Carbon Nanotube Tips

Okazaki, Ai; Kishida, Takayoshi; Akita, Seiji; Nishijima, Hidehiro; Nakayama, Yoshikazu

doi:10.1143/jjap.39.7067

Cited by 10 publications

(3 citation statements)

References 14 publications

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“…In addition, CNTs have considerable mechanical flexibility and, therefore, can be elastically buckled without damage [ 9 ]. The application of CNT probes for nanooxidation [ 10 ] began almost simultaneously with the improvement in resolution for image measurements [ 11 ]. It is expected that the improvement of probe will open up the great possibilities for miniaturization, because the size of fabricated oxide nanostructures is predominantly determined by the probe apex.…”

Section: Introductionmentioning

confidence: 99%

Scanned Probe Oxidation onp-GaAs(100) Surface with an Atomic Force Microscopy

Juang

2008

Nanoscale Res Lett

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Locally anodic oxidation has been performed to fabricate the nanoscale oxide structures onp-GaAs(100) surface, by using an atomic force microscopy (AFM) with the conventional and carbon nanotube (CNT)-attached probes. The results can be utilized to fabricate the oxide nanodots under ambient conditions in noncontact mode. To investigate the conversion of GaAs to oxides, micro-Auger analysis was employed to analyze the chemical compositions. The growth kinetics and the associated mechanism of the oxide nanodots were studied under DC voltages. With the CNT-attached probe the initial growth rate of oxide nanodots is in the order of ~300 nm/s, which is ~15 times larger than that obtained by using the conventional one. The oxide nanodots cease to grow practically as the electric field strength is reduced to the threshold value of ~2 × 107 V cm−1. In addition, results indicate that the height of oxide nanodots is significantly enhanced with an AC voltage for both types of probes. The influence of the AC voltages on controlling the dynamics of the AFM-induced nanooxidation is discussed.

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Section: Introductionmentioning

confidence: 99%

Scanned Probe Oxidation onp-GaAs(100) Surface with an Atomic Force Microscopy

Juang

2008

Nanoscale Res Lett

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“…After the first use of the multiwalled nanotube (MWNT, 10-20 nm in diameter) probe in a scanning tunnelling microscope [15], the aptitude of carbon nanotubes as probes of the atomic force microscope (AFM) was proved by studying the mechanical properties [16]. The application of CNT probes for nano-oxidation [10] began at almost the same time as the improvement in resolution for image measurements [17,18]. A previous study on increasing the density of recording dots in the high-density data storage field proved that the diameter of the CNT on the probe governed the oxide size [11].…”

Section: Introductionmentioning

confidence: 99%

Nano-oxidation andin situfaradaic current detection using dynamic carbon nanotube probes

et al. 2004

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Carbon nanotube-attached atomic force microscope probes were successfully used without nanotube bending to make simultaneous precision nano-oxidation and faradaic current measurements in the dynamic mode. Probe oxidation on H-passivated Si(001) surfaces was carried out by two methods involving vector-scan and raster-scan with a much higher resolution and precision compared to the nanofabrication by standard cantilevers. Faradaic current of the order of a sub-picoampere was detected during nano-oxidation using a carbon nanotube probe, accurately reflecting the subtle difference in the oxidation reaction. The minute current detection through the AFM tip is sensitive enough for the detection of very thin oxides and small-sized features. The dimension of the meniscus during nano-oxidation, which is indispensable for establishing the mechanism model, was evaluated, based on the in situ faradaic current detection and edge broadening.

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“…There have been some demonstrations on conventional 2D lithography by using CNT tips, 15,16 but as shown by Koops, 1 conventional lithography is not effective for the fabrication of 3D nanostructures.…”

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confidence: 99%

Electron-beam-induced deposition with carbon nanotube emitters

Dong

Arai

Fukuda

2002

Applied Physics Letters

132

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Electron-beam-induced deposition ͑EBID͒ is performed with multiwalled carbon nanotube emitters that are assembled to atomic force microscope cantilevers through nanorobotic manipulations. A typical experiment shows that under 120 V bias, field emission current 2 A occurs from a nanotube emitter. In comparison with conventional EBID with a Schottky-type electron gun of a field-emission scanning electron microscope ͑FESEM͒ in the same vacuum chamber, the deposition rate of the nanotube emitter reaches up to 12.2% of that of FESEM although the bias and the emission current are only 0.8% and 1.9% of those of FESEM ͑15 kV and 106 A͒. The concept of parallel EBID is also presented.Electron-beam-induced deposition ͑EBID͒ is caused by the dissociation of molecules adsorbed to a surface by highenergy electrons, and has been demonstrated as an additive nanolithography 1 for many applications such as etch masks, 2,3 atomic force microscope ͑AFM͒ probe tips, 4 -6 and other nanostructures. 7,8 However, low deposition rates and high cost obstacle its applications although its potential feature size can be smaller than its counterpart: focused ion beam deposition for the fabrication of 3D nanostructures. Although multiexposure electron beam 9 can improve its productivity, it provides no solution for the problem of cost because it still involves field-emission scanning electron microscope ͑FESEM͒ or similar equipments that equipped with expensive thermal electron filaments. Parallel EBID with cheaper field emitter array will be a synthetic solution for the above problem, but no work has been demonstrated so far.On the other hand, carbon nanotubes ͑CNTs͒ have been demonstrated as well-defined cold cathodes, 10 because they can emit high current density under very low bias. Although intensive work has been done on the investigation of the field emission properties of CNTs 11 and their applications in flat display, 12 there has been no demonstration yet showing the feasibility of EBID with CNT emitters. Because of the possibility to fabricate well-aligned CNT arrays, 13,14 they may also find applications in parallel EBID, which will lead to broader application of EBID.There have been some demonstrations on conventional 2D lithography by using CNT tips, 15,16 but as shown by Koops, 1 conventional lithography is not effective for the fabrication of 3D nanostructures.In this letter, we show the feasibility of EBID through individual CNT emitters, and present parallel EBID with CNT arrays as a 3D large-scale nanofabrication technique.The experiment system of CNT emitter for EBID is shown in Fig. 1, in which a CNT is mounted on an AFM cantilever and is placed above an Au-coated Si substrate. The CNT is used as cathode, while the substrate as anode. The gap L between the tip of the CNT and the substrate can be adjusted by mounting the cantilever and substrate onto unit 1 and unit 2 of the nanorobotic manipulation system 17,18 shown in Fig. 2, which also provides the possibility to generate a deposit pattern through EBID onto the substrat...

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Direct Nanolithography of Organic Polysilane Films Using Carbon Nanotube Tips

Cited by 10 publications

References 14 publications

Scanned Probe Oxidation onp-GaAs(100) Surface with an Atomic Force Microscopy

Scanned Probe Oxidation onp-GaAs(100) Surface with an Atomic Force Microscopy

Nano-oxidation andin situfaradaic current detection using dynamic carbon nanotube probes

Electron-beam-induced deposition with carbon nanotube emitters

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