2012
DOI: 10.1002/pssa.201200057
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Direct nanopatterning of commercially pure titanium with ultra‐nanocrystalline diamond stamps

Abstract: In order to directly imprint features into a hard metal such as titanium, an imprinting stamp composed of material of greater hardness is required. Diamond is the hardest known material, so is an obvious choice for the production of direct‐imprint stamps. Diamond also benefits from a low surface energy, chemical inertness, high resistance to wear and is easily cleaned of contaminants, further favouring it as a stamp material of choice. Chemical vapour deposited ultra‐nanocrystalline diamond (UNCD) provides sim… Show more

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Cited by 9 publications
(9 citation statements)
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“…Detailed information about the material and the stamp fabrication can be found in our earlier paper [16]. The UNCD wafer was scribed into 1 × 1 cm 2 samples and subjected to RCA cleaning (SC-1), followed by ultrasonic solvent cleaning.…”
Section: Methodsmentioning
confidence: 99%
“…Detailed information about the material and the stamp fabrication can be found in our earlier paper [16]. The UNCD wafer was scribed into 1 × 1 cm 2 samples and subjected to RCA cleaning (SC-1), followed by ultrasonic solvent cleaning.…”
Section: Methodsmentioning
confidence: 99%
“…Moreover, A.I.M. Greer et al performed the direct NIL to construct nanostructures on Ti surface using a diamond stamp [15,16]. Ti was widely adopted in biomedical applications such dental and orthopaedic implants [15][16][17].…”
Section: Direct Nilmentioning
confidence: 99%
“…The surface features of the Ti-based implants would influence the cell adhesion property. For example, to precisely control the surface morphologies of the Ti-based implants might help to prevent unwanted cell growth on temporary implants [15]. However, Ti was a relatively hard material that was difficult to pattern.…”
Section: Direct Nilmentioning
confidence: 99%
“…However, most of the EBL methods developed so far for cells guidance have been used to actually create high resolution masters for subsequent patterning of polymeric substrates usually by replica molding and micro/nanoimprinting [1,[9][10][11][12][13]19]. The need of a new master or mold for every different pattern and the difficulty to accurately imprint the patterns into metals [20,21] hinder the possibility to perform systematic research using various well-controlled patterns, and limit generation of a large number of different samples needed for such biological studies. A direct EBL method for Ti patterning would overcome these limitations and eliminate the use of additional imprinting steps.…”
Section: Introductionmentioning
confidence: 99%