Direct observation of atomic-level fractal structure in a metallic glass membrane

Microscopic Structural Evolution during Ultrastable Metallic Glass Formation

“…43 In a recent experimental and simulation study on vapor deposition of atomically thin MG membranes employing the same ion beam deposition as in our study, it was found that after arriving at the substrate the atoms aggregate to form a fractal structure on a length scale comparable to the composition segregation in our observation. 44 On the other hand, our results and those of Barbee et al (R = 30−60 nm min −1 ) 40 indicate that composition segregation is pronounced at higher R values. Therefore, it can be concluded that the composition segregation in vapor-deposited ZrCu(Al) MGs occurs rapidly during the aggregation process, driven by the kinetic energy of the depositing atoms.…”

“…35 In a recent experimental and simulation study on vapor-deposited atomically thin MG membranes, it was found that after arriving at the substrate the atoms aggregate to form a fractal structure on a length scale comparable to the phase separations of our observation. 36 On the other hand, our results and those of Barbee et al 32 indicate that phase separation is pronounced at higher R. Therefore, it can be concluded that the phase separation in vapor-deposited ZrCu(Al) MGs occurs rapidly during the aggregation process, driven by the kinetic energy of the depositing atoms. However, for ZrCu(Al) MGs with negative heat of mixing (Table S1), 34 a homogeneous structure without decomposition is thermodynamically more favored.…”

Fractal Analysis on Surface Topography of Thin Films: A Review

“…(2) Structure function method In surface topography, the structural function of a spatial sequence with fractal features is Equation (15).…”

“…Talu S. et al [32] 2016 Co/CP/X Electrochemistry SEM Feng F. et al [76] 2017 MgO EPSAD AFM Nasehnejad M. et al [81] 2017 silver electrodeposition sputtering AFM Soumya S. et al [43] 2017 ZnS PLD AFM Yadav R. P. et al [91] 2017 ZnO atom beam sputtering AFM Talu S. et al [73] 2017 Ag-Cu magnetron sputtering AFM Talu S. et al [142] 2017 carbon-nickel magnetron sputtering AFM Talu S. et al [165] 2017 contact lenses polished AFM Talu S. et al [143] 2017 filler nanoparticles spin-coating AFM Talu S. et al [144] 2017 Ni NPs@a-C CVD AFM Sani Z. K. et al [145] 2017 [155] 2019 C8-BTBT meniscus-guided coating OM Ghosh K. et al [86] 2019 ZnO sol-gel spin-coating AFM Mwema F. M. et al [156] 2019 Al magnetron sputtering AFM Pedro, G.d.C. et al [157] 2019 chlorophyll (Chl) casting & drying OM Talu S. et al [63] 2020 Ag-Cu magnetron sputtering AFM Jafari A. et al [158] 2020 copper oxide magnetron sputtering AFM Yildiz K. et al [159] 2020 montmorillonite cast OM Aminirastabi H. et al [160] 2020 BaTiO 3 sol-gel -Yang L. et al [161] 2021 Pt electroless plating SEM Jiang Y. et al [163] 2021 MoS 2 CVD OM Jiang H. et al [15] 2021 metallic glass ion beam deposition STEM Romaguera Y. et al [164] 2021 GdMnO 3 spin-coating AFM…”

“…For films deposited under non-equilibrium conditions, the surface is usually self-affine rather than self-similar. The possible reason is that the newly absorbed atomic layers are correlated with their adjacent, deposited surface during diffusion process [13][14][15][16][17]. In addition, they showed that the scale dependence of surface roughness can be revealed by calculating the fractal dimension (FD).…”