IntroductionTopological phases of matter differ from conventional materials in that the former feature a nontrivial topological invariant in their bulk electronic wavefunction space [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. The experimental discoveries of the two-dimensional (2D) integer and fractional quantum Hall (IQH and FQH) states [15][16][17][18][19] in the 1980s realized the first two topological phases of matter in nature. These 2D topological systems are insulators in the bulk because the Fermi level is located in the middle of two Landau levels. On the other hand, the edges of these 2D topological insulators (TIs) (IQH and FQH) feature chiral 1D metallic states, leading to remarkable quantized charge transport phenomena. The quantized transverse magneto-conductivity = ne 2 ∕h (where e is the electric charge and h is the Planck constant) can be probed by charge transport experiements, which also provides a measure of the topological invariant (the Chern number) n that characterizes these quantum Hall states [20,21]. In 2005, theoretical advances [22, 23] predicted a third type of 2D TI, the quantum spin Hall (QSH) insulator. Such a topological state is symmetry-protected. A QSH insulator can be viewed as two copies of quantum Hall systems that have magnetic fields in the opposite direction. Therefore, no external magnetic field is required for the QSH phase, and the pair of quantum-Hall-like edge modes are related by the time-reversal (TR) symmetry (Figure 4.1). In 2007, the QSH phase was experimentally demonstrated in the (Hg, Cd)Te quantum wells using charge transport by measuring a longitudinal conductance of about 2e 2 ∕h (two copies of quantum Hall currents) at millikelvin temperatures [24]. The topological number that describes the QSH phase is a Z 2 invariant (ν). The Z 2 invariant can only take two values, 0 or 1, where ν = 0(1) is topologically trivial (nontrivial).However, it is important to note that the 2D topological (IQH, FQH, and QSH) insulators are realized only at buried interfaces of ultraclean semiconductor