Direct Patterning of Robust One-Dimensional, Two-Dimensional, and Three-Dimensional Crystalline Metal Oxide Nanostructures Using Imprint Lithography and Nanoparticle Dispersion Inks

Kothari, Ravi; Beaulieu, Michael R.; Hendricks, Nicholas R.; Li, Shengkai; Watkins, James J.

doi:10.1021/acs.chemmater.6b05398

Cited by 48 publications

(50 citation statements)

References 34 publications

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“…Other publications from our group show NIL patterning of titania surface patterns with cycle times of a few minutes or less. 32,36 NOA, TiO 2 -10, and TiO 2 -50 assemblies were cured under UV exposure, and ceramic TiO 2 –C shark-skin assemblies were cured under NIR irradiation. After completing the curing process, the PDMS mold was peeled off, revealing microstructured shark-skin-patterned films.…”

Section: Resultsmentioning

confidence: 99%

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Bioinspired Photocatalytic Shark-Skin Surfaces with Antibacterial and Antifouling Activity via Nanoimprint Lithography

Arisoy

Kolewe

Homyak

et al. 2018

ACS Appl. Mater. Interfaces

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172

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By combining antifouling shark-skin patterns with antibacterial titanium dioxide (TiO2) nanoparticles (NPs), we present a simple route toward producing durable multifunctional surfaces that decrease microbial attachment and inactivate attached microorganisms. Norland Optical Adhesive, a UV-crosslinkable adhesive material, was loaded with 0, 10, or 50 wt % TiO2 NPs from which shark-skin microstructures were imprinted using solvent-assisted soft nanoimprint lithography on a poly(ethylene terephthalate) (PET) substrate. To obtain coatings with an exceptional durability and an even higher concentration of TiO2 NPs, a solution containing 90 wt % TiO2 NPs and 10 wt % tetraethyl orthosilicate was prepared. These ceramic shark-skin-patterned surfaces were fabricated on a PET substrate and were quickly cured, requiring only 10 s of near infrared (NIR) irradiation. The water contact angle and the mechanical, antibacterial, and antifouling characteristics of the shark-skin-patterned surfaces were investigated as a function of TiO2 composition. Introducing TiO2 NPs increased the contact angle hysteresis from 30 to 100° on shark-skin surfaces. The hardness and modulus of the films were dramatically increased from 0.28 and 4.8 to 0.49 and 16 GPa, respectively, by creating ceramic shark-skin surfaces with 90 wt % TiO2 NPs. The photocatalytic shark-skin-patterned surfaces reduced the attachment of Escherichia coli by ~70% compared with smooth films with the same chemical composition. By incorporating as low as 10 wt % TiO2 NPs into the chemical matrix, over 95% E. coli and up to 80% Staphylococcus aureus were inactivated within 1 h UV light exposure because of the photocatalytic properties of TiO2. The photocatalytic shark-skin-patterned surfaces presented here were fabricated using a solution-processable and roll-to-roll compatible technique, enabling the production of large-area high-performance coatings that repel and inactivate bacteria.

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Section: Resultsmentioning

confidence: 99%

“…At high RH (above 30%), spin-coated films become thinner. 32 Optimum humidity was determined to be below 20% RH. The spin-coating speed and time can be adjusted according to RH to obtain desirable thickness and fluidity of the film.…”

Section: Resultsmentioning

confidence: 99%

Bioinspired Photocatalytic Shark-Skin Surfaces with Antibacterial and Antifouling Activity via Nanoimprint Lithography

Arisoy

Kolewe

Homyak

et al. 2018

ACS Appl. Mater. Interfaces

Self Cite

172

View full text Add to dashboard Cite

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“…George and Elshof used an edge transfer technique to mold ZnO, CuO, NiO, and Fe 2 O 3 patterns with a sub‐50 nm line width . Kothari et al molded isolated TiO 2 patterns in a high humidity (70–80%) environment . Another issue for micro‐ and nanomolding is the low throughput due to the heating cycles required to dry the precursor films.…”

Section: Mo Patterns Made By Solution Direct‐patterning Techniquesmentioning

confidence: 99%

Section: Mo Patterns Made By Solution Direct‐patterning Techniquesmentioning

confidence: 99%

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

2018

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Due to their transparency and tunable electrical, optical, and magnetic properties, metal oxide thin films and structures have many applications in electro-optical devices. In recent years, solution processing combined with direct-patterning techniques such as micro-/nanomolding, inkjet printing, e-jet printing, e-beam writing, and photopatterning has drawn much attention because of the inexpensive and simple fabrication process that avoids using capital-intensive vacuum deposition systems and chemical etching. Furthermore, practical applications of solution direct-patterning techniques with metal oxide structures are demonstrated in thin-film transistors and biochemical sensors on a wide range of substrates. Since direct-patterning techniques enable low-cost fabrication of nanoscale metal oxide structures, these methods are expected to accelerate the development of nanoscale devices and systems based on metal oxide components in important application fields such as flexible electronics, the Internet of Things (IoT), and human health monitoring. Here, a review of the fabrication procedures, advantages, limitations, and applications of the main direct-patterning methods for making metal oxide structures is presented. The goal is to highlight the examples with the most promising perspective from the recent literature.

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“…By utilizing these intriguing properties of each nano‐ and microstructures simultaneously, multiscale hierarchical structures can provide multifunctional effects to the system and maximize their function without the need for any further physicochemical processes. Thus, there have been many attempts to use multiscale hierarchical structures in diverse fields and applications, including micro/nanofluidics, wearable devices, optical devices, and energy systems with various materials including polymers, metals, and ceramics …”

Section: Introductionmentioning

confidence: 99%

Multiscale Hierarchical Patterning by Sacrificial Layer‐Assisted Creep Lithography

Jang

Choi

Shin

et al. 2019

Adv Materials Inter

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to the expectation that technological breakthroughs can be achieved. [1][2][3] As is well known in literature, nanostructures exhibit unique properties such as plasmonic effects, [4] antireflection, [5] structural color, [6] super-hydrophobicity, [7] adhesion, [8] superior catalytic activity, [9] and charge transport. [10] Microstructures lend mechanical properties (e.g., stress-strain relationship, hardness, and flexibility) [7] to the system and enable the control of light, liquid, and gas pathways. [11][12][13][14] By utilizing these intriguing properties of each nanoand microstructures simultaneously, multi scale hierarchical structures can provide multifunctional effects to the system and maximize their function without the need for any further physicochemical processes. Thus, there have been many attempts to use multiscale hierarchical structures in diverse fields and applications, including micro/nanofluidics, [15] wearable devices, [16] optical devices, [17,18] and energy systems [19,20] with various materials including polymers, metals, and ceramics. [21,22] Our recent study showed that multiscale hierarchical structure can be simply and easily fabricated with the aid of creep behavior of a polymer, [23] which is a permanent deformation of the material due to the viscoelastic behavior of the polymer under long-term stress below the glass transition temperature. In this work, nanostructures were first carved onto polymer films by hot-embossing nanoimprint lithography (NIL) and then followed by a second imprinting with a micropattern mold using the creep deformation characteristic of the polymer film. This facile multiscale patterning method does not require any sophisticated process and equipment. Further, by using Nafion as a substrate that has a low modulus (≈250 MPa) and large creep deformation property, [24,25] we can use diverse polymeric molds instead of metallic molds that require very high pressures for conformal contact with the substrate. However, this method had a weakness that previously carved nanostructures also inevitably underwent creep deformation during the second imprinting process, which led to deformation of the original morphologies of the nanostructures.To address this issue, we introduced a poly(methyl methacrylate) (PMMA) sacrificial layer to protect the preformed structures before the secondary creep-based imprinting process. The PMMA sacrificial layer has a larger modulus (≈3 GPa) [26] The capability to fabricate various multiscale structures without limitations of size, morphology, and number of hierarchies via a simple process is highly desired in modern research. This work reports a powerful multiscalepatterning method called sacrificial layer-assisted creep lithography (SCL). Multiscale structures are successfully obtained by introducing a sacrificial layer, which has low creep compliance and preferential solubility in a nonpolar solvent, on a Nafion film during an additional creep-based imprinting process. Through this method, deformation or geometrical loss of preformed st...

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Direct Patterning of Robust One-Dimensional, Two-Dimensional, and Three-Dimensional Crystalline Metal Oxide Nanostructures Using Imprint Lithography and Nanoparticle Dispersion Inks

Cited by 48 publications

References 34 publications

Bioinspired Photocatalytic Shark-Skin Surfaces with Antibacterial and Antifouling Activity via Nanoimprint Lithography

Bioinspired Photocatalytic Shark-Skin Surfaces with Antibacterial and Antifouling Activity via Nanoimprint Lithography

Solution‐Based Micro‐ and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro‐Optical Applications

Multiscale Hierarchical Patterning by Sacrificial Layer‐Assisted Creep Lithography

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