2021
DOI: 10.1049/ell2.12126
|View full text |Cite
|
Sign up to set email alerts
|

Direct UV written waveguides and Bragg gratings in doped planar silica using a 213 nm laser

Abstract: In this paper, the first demonstration of simultaneous UV written Bragg gratings and waveguides in germanium and boron‐doped planar silica is presented using a 5th harmonic solid‐state nanosecond laser operating at 213 nm wavelength. The fabrication of high‐quality gratings by using a high peak power density, yielding sufficient uniformity and without any surface damage is demonstrated. The photosensitivity of the doped silica layer is investigated by measuring the local effective refractive index of the optic… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
4
3

Relationship

1
6

Authors

Journals

citations
Cited by 17 publications
(3 citation statements)
references
References 20 publications
0
3
0
Order By: Relevance
“…These chips are then left in a pressurized Hydrogen cell for several days prior to writing to increase photosensitivity [4]. Next, a UV laser operating at a wavelength of 213nm and power of 30mW was used to UV write Bragg gratings within the photosensitive core layer using a method similar to the small spot technique [3,5]. The beam is split and one arm is passed through an EOM to allow control of the phase (figure 1).…”
Section: Methods and Resultsmentioning
confidence: 99%
“…These chips are then left in a pressurized Hydrogen cell for several days prior to writing to increase photosensitivity [4]. Next, a UV laser operating at a wavelength of 213nm and power of 30mW was used to UV write Bragg gratings within the photosensitive core layer using a method similar to the small spot technique [3,5]. The beam is split and one arm is passed through an EOM to allow control of the phase (figure 1).…”
Section: Methods and Resultsmentioning
confidence: 99%
“…One method to couple light out of an integrated waveguide and into free space is using direct UV writing to create a tilted Bragg grating [1]. This fabrication technique involves focusing two UV beams to form an interference pattern in a silica chip, resulting in a periodic refractive index modulation with small refractive index contrast [2]. By controlling the grating period and index modulation along the waveguide, target light beams of specific spot shape and size can be designed.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, this photorefractive glass-ceramic can settle the issue of rare-earths' low absorption crosssection. Furthermore, it can provide strategic fabrication approach for defining channel waveguides and optical gratings with minimal losses using direct UV writing technique [4][5][6].…”
Section: Introductionmentioning
confidence: 99%