Discharge Characteristics and Effect of DC Bias on the Deposition Rate of Ni Thin Films Using RF-DC Coupled Magnetron Sputtering.

Mikami, Y.; Yamada, Keiji; Ohnari, A.; Degawa, Toru; Tanaka, Takeshi; Kawabata, Ken‐ichi

doi:10.3131/jvsj.43.307

SHINKU

2000

DOI: 10.3131/jvsj.43.307

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Discharge Characteristics and Effect of DC Bias on the Deposition Rate of Ni Thin Films Using RF-DC Coupled Magnetron Sputtering.

Y. Mikami

Keiji Yamada

A. Ohnari

et al.

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Discharge Characteristics and Effect of DC Bias on the Deposition Rate of Ni Thin Films Using RF-DC Coupled Magnetron Sputtering.

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