2022
DOI: 10.1007/s10854-022-08181-1
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Discrepancies in barrier heights obtained from current–voltage (IV) and capacitance–voltage (CV) of Au/PNoMPhPPy/n-GaAs structures in wide range of temperature

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Cited by 19 publications
(6 citation statements)
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“…Because, at low-temperatures, more and more electrons can cross the the existence of low barriers or patches at around mean BH and so leads an increase in the reverse-saturation currend and hence leads an increase in Φ B0 and a large n values. 14,16,17 Accordingly, current conduction is delimitated by I passing through the lower-barriers. However, with the increase in temperature, the electrons can gain more energy to cross higher barriers.…”
Section: Resultsmentioning
confidence: 99%
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“…Because, at low-temperatures, more and more electrons can cross the the existence of low barriers or patches at around mean BH and so leads an increase in the reverse-saturation currend and hence leads an increase in Φ B0 and a large n values. 14,16,17 Accordingly, current conduction is delimitated by I passing through the lower-barriers. However, with the increase in temperature, the electrons can gain more energy to cross higher barriers.…”
Section: Resultsmentioning
confidence: 99%
“…In general, the BH value extracted from the standard TE theory is usually decrease with temperature and n increases due to the existence inhomogeneities of BH at M/S interface and these higher changes at lower temperaures cannot explain only in terms of standard TE and TFE theories. [11][12][13][14] The objective of this work is to an investigate temperature dependent basic electric parameters and possible CTCs in the Au/Al 2 O 3 /n-Si SDs between 200 K and 400 K by using the IV between ±3 V. In this study, the increase in BH observed with increase in the temperature, higher values of n even at room temperature, and the deviation linearity of the conventional RP were successfully explained by the GD-model.…”
mentioning
confidence: 81%
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“…Metal-semiconductor-type SBDs transform into MIS/MFS/MPS-kind of SBDs when an interface is formed among metal and semiconductors. But, the interlayer is higher than at about 4-5 hundred nanometers, this structures act a capacitor which storage more electrons or energy (Sze & Ng, 2007;Gencer Imer et al, 2019;Altındal et al, 2022). However, the used an interlayer can be considerably affect both the basic electrical parameters and conduction mechanism of these a structures.…”
Section: Introductionmentioning
confidence: 99%
“…Among various factors, a lower potential barrier at the MS interface often aids in ohmic nature of the contact [1]. In practice, MS contacts (both ohmic and Schottky) are often fabricated using various deposition processes [2][3][4][5][6][7][8] and formation of a good ohmic contact is very much necessary to carry out accurate current-voltage (I-V) and other electron transport measurements. Assuming thermionic emission (TE) as the dominating charge transport mechanism, the current-voltage relationship of a Schottky diode resembles a p-n one apart from the fact that only majority carriers dominate in case of a Schottky diode, and from semi-logarithmic I-V plot; diode parameters such as Ideality factor (n), Barrier Height (Φ), and series resistance (R S ) can be extracted [9].…”
Section: Introductionmentioning
confidence: 99%