2022
DOI: 10.1016/j.vacuum.2021.110800
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Dislocation density control of GaN epitaxial film and its photodetector

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Cited by 11 publications
(3 citation statements)
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“…The calculated screw dislocation densities are 5 10 8 cm -2 for S2 and 2.4 10 8 cm -2 for S1, which are the same magnitude as those previously reported [20]. Zhu et al [21] reported that the spectra of symmetric reflections (00.l) are broadened only by screw dislocations and the screw component of mixed dislocations, while those of asymmetric reflections are broadened by edge dislocations and the edge component of mixed dislocations.…”
Section: Resultssupporting
confidence: 84%
“…The calculated screw dislocation densities are 5 10 8 cm -2 for S2 and 2.4 10 8 cm -2 for S1, which are the same magnitude as those previously reported [20]. Zhu et al [21] reported that the spectra of symmetric reflections (00.l) are broadened only by screw dislocations and the screw component of mixed dislocations, while those of asymmetric reflections are broadened by edge dislocations and the edge component of mixed dislocations.…”
Section: Resultssupporting
confidence: 84%
“…Compared with Sample B, Sample A increases the J SC of the SCs from 1.79 mA cm −2 to 5.54 mA cm −2 and the PCE from 4.29% to 4.37% due to the tunneling effect model. However, due to significant defects in the epitaxial materials of the SLs structure during the growth process, these dislocations serve as non-radiative recombination centers in the device, reducing the device's R sh and further increasing leakage current, ultimately leading to a decrease in V OC of the SCs with SLs structure compared to the SCs with MQWs structure from 2.65 V to 1.22 V. [27][28][29] This is the same trend as the experimental values. The exact values can be seen in the inset of Fig.…”
supporting
confidence: 76%
“…The dislocation densities are similar to those of GaN films grown on LGS by MBE, 10 indicating that the GaN films with similar quality are prepared using a more economical method. However, the dislocation densities are more than 1 order of magnitude higher than the GaN films grown on the sapphire substrate by several improved techniques in recent years, 29,30 thus the growth conditions should be further optimized in order to raise the quality of films. So far, no research has investigated the type of the TDs of GaN films grown on LGS-type crystals; Figure 7 shows the cross-sectional TEM images of GaN films in this work.…”
Section: Structure Characterization Of Gan Films On Cnasmentioning
confidence: 99%