This article is dedicated to Dieter Vollhardt on the occasion of his 60th birthday.The metal-insulator (MI) transition in Si:P can be tuned by varying the P concentration or -for barely insulating samples -by application of uniaxial stress S. On-site Coulomb interactions lead to the formation of localized magnetic moments and the Kondo effect on the metallic side, and to a Hubbard splitting of the donor band on the insulating side. Continuous stress tuning allows the observation of finite-temperature dynamic scaling of σ(T, S) and hence a reliable determination of the critical exponent μ of the extrapolated zero-temperature conductivity σ(0) ∼ |S − Sc| µ , i.e., μ = 1, and of the dynamical exponent z = 3. The issue of half-filling vs. away from half-filling of the donor band (i.e., uncompensated vs. compensated semiconductors) is discussed in detail.