2001
DOI: 10.1016/s1387-3806(00)00271-2
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Dissociative electron attachment to CCl4 molecules at low electron energies with meV resolution

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Cited by 88 publications
(116 citation statements)
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“…0) which -in terms of Eq. (40) (Klar et al, 1992b) and ¼ 0.59(6) for CCl 4 (Hotop et al, 1995;Klar et al, 2001a), in both cases distinctly larger than the prediction obtained from the Klots formula (21), namely K ¼ 0.228 for SF 6 and K ¼ 0.299 for CCl 4 . For SF 6 , Schramm et al (1998) measured the attachment yield at residual electric fields as low as 0.01 V/m and negligible laser bandwidth for electron energies from 10 meV down to 20 meV; they confirmed the results of Klar et al (1992b) for the parameter .…”
Section: B3 Electron Attachment To Sf 6 and CCLmentioning
confidence: 60%
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“…0) which -in terms of Eq. (40) (Klar et al, 1992b) and ¼ 0.59(6) for CCl 4 (Hotop et al, 1995;Klar et al, 2001a), in both cases distinctly larger than the prediction obtained from the Klots formula (21), namely K ¼ 0.228 for SF 6 and K ¼ 0.299 for CCl 4 . For SF 6 , Schramm et al (1998) measured the attachment yield at residual electric fields as low as 0.01 V/m and negligible laser bandwidth for electron energies from 10 meV down to 20 meV; they confirmed the results of Klar et al (1992b) for the parameter .…”
Section: B3 Electron Attachment To Sf 6 and CCLmentioning
confidence: 60%
“…32 we compare the recommended experimental DA cross-section for CCl 4 (consisting of the LPA cross-section at energies below 173 meV and electron beam data due to Chu and Burrow (1990) at higher energies, see also Klar et al, 2001a) with the VW s-wave prediction and the LPA fit of Klar et al (2001a). The slope of the experimental curve is steeper than that given by the VW model.…”
Section: B3 Electron Attachment To Sf 6 and CCLmentioning
confidence: 98%
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