2015
DOI: 10.1016/j.solmat.2014.08.022
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Distribution and propagation of dislocation defects in quasi-single crystalline silicon ingots cast by the directional solidification method

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Cited by 20 publications
(7 citation statements)
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“…4a and c, respectively). They are therefore of a/2 [1][2][3][4][5][6][7][8][9][10] type, which indicates that they are perfect edge dislocations. These dislocations are very evenly separated, about 90 nm apart.…”
Section: Tem and In-situ Tem High Temperature Strainingmentioning
confidence: 99%
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“…4a and c, respectively). They are therefore of a/2 [1][2][3][4][5][6][7][8][9][10] type, which indicates that they are perfect edge dislocations. These dislocations are very evenly separated, about 90 nm apart.…”
Section: Tem and In-situ Tem High Temperature Strainingmentioning
confidence: 99%
“…Here, we have clearly established that the densest SGB dislocations are separated by 90 nm and that this distance can be also resolved by etch pits observation inside the SEM. The shape of d2 dislocations lines that follow the growth direction [001] and the trace of the {-1-11} glide plane suggests that these dislocations are either the result of an elastic interaction between gliding a/2[101] dislocations and those from the SGB, or an attractive reaction between gliding a/2[0-1-1] dislocations and the a/2 [1][2][3][4][5][6][7][8][9][10] dislocations of the d1 family according to the scheme:…”
Section: Grain Boundary Structure and Misorientationsmentioning
confidence: 99%
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“…SA‐GBs are of particular interest for the quasi‐mono crystalline silicon solidification method: multiple seeds are necessary for the growth of large crystals and the seed junctions and the resulting SA‐GBs are regions of thermal and mechanical stress concentration, where plastic deformation is more likely to occur . These regions have been identified as the primary source of dislocations in seed‐assisted crystal growth of silicon .…”
Section: Introductionmentioning
confidence: 99%