Abstract:Cu2O films deposited by reactive magnetron sputtering with varying Li concentrations have been investigated by a combination of temperature-dependent Hall effect measurement and thermal admittance spectroscopy. As measured by secondary ion mass spectrometry, Li concentrations up to 5x1020 Li/cm3 have been achieved. Li doping significantly alters the electrical properties of Cu2O and increases hole concentration at room temperature for higher Li concentrations. Moreover, the apparent activation energy for the d… Show more
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