2021
DOI: 10.1007/s10825-021-01693-9
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Doping engineering to enhance the performance of double-gate pMOSFETs with ultrashort gate length (5 nm)

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Cited by 2 publications
(2 citation statements)
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“…Khaliq et al used doping engineering to improve the electrical characteristics in double-gate pMOSFETs hosting a 5 nm gate length [353]. A NEGF approach was used in combination with a six-band k • p Hamiltonian.…”
Section: Other Types Of Fets and Diodesmentioning
confidence: 99%
“…Khaliq et al used doping engineering to improve the electrical characteristics in double-gate pMOSFETs hosting a 5 nm gate length [353]. A NEGF approach was used in combination with a six-band k • p Hamiltonian.…”
Section: Other Types Of Fets and Diodesmentioning
confidence: 99%
“…Furthermore, in organic light-emitting diodes (OLEDs), the intrinsic emission zone's thickness and quality between p-doped and n-doped regions are vital for device performance, with an optimal emitter layer thickness of 20 nm being identified [19]. Overall, achieving optimal OPD performance requires a delicate balance of layer thickness, precise doping densities, and high-quality interfaces to minimize recombination and maximize efficiency [20], [21], [22].…”
Section: Introductionmentioning
confidence: 99%