Double-appearance patterning model of warp-knitted spacer textiles based on the jacquard loop index

Abstract

This research focuses on a three-dimensional jacquard spacer fabric, which has two sets of jacquard yarn systems to form double-appearance patterns. Because of the unique structure and formation characteristics, a specific computerized patterning model needs to be solved for efficient jacquard structure design. After a systematic analysis of double-needle bed knitting and the piezo-jacquard principle, a loop index is proposed to coordinate jacquard loops and define the single-loop-based jacquard bitmap. Also, an algorithm is derived to solve offset data to guide the knitting action by inferring the jacquard bitmap and the corresponding loops hypotaxis. This new patterning method is proposed based on two basic elements of the jacquard bitmap and lapping data. In comparison with the traditional two-course bitmap method, the new approach shows the advantage of more simplified operations by a significant decrease of jacquard color definitions.

Three-dimensional simulation based on mesh modelling for warp-knitted fully-formed garments

“…A lot of research working on the weft-knitted stitch modeling had been done (Demiroz and Dias, 2000; Choi and Lo, 2003, 2006). For the warp-knitting, stitch models based on non-uniform rational B-spline were established (Goktepe and Harlock, 2002; Zhang et al. , 2009).…”