Double layer films based on TiO2 and NiO  for gas detection

Kosc, I.; Hotovy, I.; Роч, Т.; Pleceník, T.; Gregor, M.; Predanocy, M.; Cehlarova, M.; Kúš, P.; Plecenı́k, A.

doi:10.1016/j.apsusc.2014.05.193

Cited by 11 publications

(6 citation statements)

References 34 publications

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“…2d). 10 Suzuki and co-workers reported that high-valence nickel oxides were also effective for oxidative coupling of aldehydes with methanol. 6 Therefore, the synergetic effect between Au and Ni made the bimetallic AuNi/LaMg-FDU-12 catalyst more efficient than monometallic counterparts.…”

mentioning

confidence: 99%

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Han

Zhang

et al. 2014

RSC Adv.

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mentioning

confidence: 99%

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Han

Zhang

et al. 2014

RSC Adv.

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“…X-ray diffraction confirmed the formation of polycrystalline anatase phase under these conditions [17].…”

Section: Methodsmentioning

confidence: 75%

Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO₂ Nanostructures

Hotovy

Kostič

Predanocy

et al. 2016

Journal of Electrical Engineering

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Patterning of metal oxide nanostructures with different shapes and well-defined size may play an important role in the improvement of MEMS systems, sensors and optical devices. We investigated the effects of HSQ e-beam resist processing on the fabrication of sputtered TiO 2 nanostructures. They were patterned using direct write e-beam lithography combined with ICP-RIE etching in CF 4 /Ar plasma. Experimental results confirmed that the HSQ resist with a thickness of about 600 nm is suitable as a masking material for optimal etching process and allows patterning of the dots array in TiO 2 sputtered films with a thickness up 150 nm. TiO 2 arrays with a minimal dots diameter of 180 nm and spacing of 1000 nm were successfully developed.

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“…The total gas pressure was kept constant at 0.8 Pa and adjusted by a piezoceramic valve. To stabilize the TiO 2 film properties, all films were annealed in a furnace at 500 °C in nitrogen for 1 h. X-ray diffraction confirms the formation of polycrystalline anatase under these conditions [18]. The film thickness was approximately 120 nm as measured by Talystep.…”

Section: Methodsmentioning

confidence: 99%

Patterning of titanium oxide nanostructures by electron-beam lithography combined with plasma etching

Hotovy

Kostič

Nemec

et al. 2015

J. Micromech. Microeng.

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Patterning of metal oxide nanostructures with precisely controlled geometries and spacings can play an important role in the improvement of sensors for gas detection. Titanium oxide thin films were deposited on oxidized silicon substrates by reactive magnetron sputtering at room temperature. Patterning of TiO2 nanostructures was conducted by electron beam lithography combined with plasma etching. It was found that for 120 nm-thick TiO2 nanostructure formation, HSQ e-beam resists and Cr films prove to be suitable mask materials. Experimental results showed that the size of TiO2 nanostructures depends mainly on the e-beam lithography process and they can be controlled by the design geometry and the exposure dose. TiO2 nanostructures with a minimal diameter of 70 nm and spacing of 200 nm were successfully fabricated by ICP etching in CF4/Ar plasma through negative e-beam resist HSQ.

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Double layer films based on TiO2 and NiO for gas detection

Cited by 11 publications

References 34 publications

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO₂ Nanostructures

Patterning of titanium oxide nanostructures by electron-beam lithography combined with plasma etching

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Double layer films based on TiO2 and NiO for gas detection

Cited by 11 publications

References 34 publications

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Modified extra-large mesoporous silica supported Au–Ni as a highly efficient catalyst for oxidative coupling of aldehydes with methanol

Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO2 Nanostructures

Patterning of titanium oxide nanostructures by electron-beam lithography combined with plasma etching

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Effects of HSQ e–beam Resist Processing on the Fabrication of ICP–RIE Etched TiO₂ Nanostructures