2015
DOI: 10.1016/j.sab.2015.05.010
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Double-pulse laser ablation sampling: Enhancement of analyte emission by a second laser pulse at 213 nm

Abstract: Keywords:Double laser pulse scheme Plume-LEAF Pulsed laser ablation sampling 213 nm Minimally destructive multi element analysis For the purpose of devising methods for minimally destructive multi-element analysis, we compare the performance of a 266 nm-213 nm double-pulse scheme against that of the single 266 nm pulse scheme. The first laser pulse at 266 nm ablates a mica sample. Ten ns later, the second pulse at 213 nm and 64 mJ cm −2 orthogonally intercepts the gas plume to enhance the analyte signal. Emiss… Show more

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Cited by 20 publications
(10 citation statements)
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“…This ps laser pulses are employed to produce the fast electron from the laser ablated zircaloy target for further excitation of He by the fast electron bombardment. This two-laser arrangement is different from the conventional double pulse experiments [20][21][22][23][24][25][26][27][28][29][30] where the two lasers are employed for direct ablation and further excitation of the ablated atoms. Although the ps laser is employed to serve the specific role of producing fast electrons from the target, its irradiation on the target will inevitably generate emission from the ablated atoms and the He atoms in the ambient gas near the target surface.…”
Section: Methodsmentioning
confidence: 99%
“…This ps laser pulses are employed to produce the fast electron from the laser ablated zircaloy target for further excitation of He by the fast electron bombardment. This two-laser arrangement is different from the conventional double pulse experiments [20][21][22][23][24][25][26][27][28][29][30] where the two lasers are employed for direct ablation and further excitation of the ablated atoms. Although the ps laser is employed to serve the specific role of producing fast electrons from the target, its irradiation on the target will inevitably generate emission from the ablated atoms and the He atoms in the ambient gas near the target surface.…”
Section: Methodsmentioning
confidence: 99%
“…A double-pulse LA sampling system has been proposed for minimally destructive multi-element analysis. 50 The performance of a 266 to 213 nm double-pulse scheme was compared with that of a single 266 nm pulse scheme. The initial laser pulse at 266 nm ablated a mica sample and 10 ns later the second pulse, at 213 nm and 64 mJ cm À2 , orthogonally intercepted the gas plume to enhance the analyte signal.…”
Section: Vapour Generationmentioning
confidence: 99%
“…To improve the sensitivity, a variety of methods have been developed. Some of these methods improve the LIBS signal intensity by changing the LIBS setup, such as adding a second laser pulse for secondary heating of the plasma [26][27][28][29][30]. In other methods, the sensitivity is improved by chemical treatment of the sample, such as chemical replacement to preconcentrate the element of interest in the sample [31][32][33][34].…”
Section: Introductionmentioning
confidence: 99%