SPIE Proceedings
 2001
DOI: 10.1117/12.435775
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Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Sung‐Woo Lee
1
,
Dong-Hoon Chung
2
,
In-Gyun Shin
3
et al.
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Explicit expression on specifications of mask mean to target and mask uniformity

Lee
1
,
Lee
2
,
Woo
3
et al. 2006
Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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Explicit expression on specifications of mask mean to target and mask uniformity

Lee
1
,
Lee
2
,
Woo
3
et al. 2006
Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Self Cite
3
0
1
0
View full textAdd to dashboardCite
show abstract
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