2006 International Conference on Electronic Materials and Packaging 2006
DOI: 10.1109/emap.2006.4430675
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DRAM memory electrical yield improvement by backgrinding induced backside damage

Abstract: This work investigates the electrical yield improvement by backgrinding process on DRAM backside with different wafer grinding technologies. The level of damage present in wafer backside subjected to different grinding technology is characterized. By comparing TEM analysis of strain layer and electrical testing result from samples that had undergone different backgrinding technologies, the most effective suitable processing conditions for the purpose of DRAM yield improvement were determined.

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Cited by 2 publications
(1 citation statement)
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“…But to achieve this incredible quality, manufacturers have to play a lot of tricks with ECC, bad row and column replacement, and so on. The bare yield of the DRAM cells themselves is only around 90% [5]. The memristors surveyed vary a bit in yield, but all fall within a range of 80-95%, which is obviously quite similar to DRAM.…”
Section: Rram Vs Drammentioning
confidence: 98%
“…But to achieve this incredible quality, manufacturers have to play a lot of tricks with ECC, bad row and column replacement, and so on. The bare yield of the DRAM cells themselves is only around 90% [5]. The memristors surveyed vary a bit in yield, but all fall within a range of 80-95%, which is obviously quite similar to DRAM.…”
Section: Rram Vs Drammentioning
confidence: 98%