“…The high ON state current is a prime requirement for high performance devices but TFET is deprived in this prospective. There are many techniques available nowadays to overcome the challenge such as using high-k gate dielectric [6], strain silicon technique [7], dual material gate [8,9], hetero-gate dielectric [10], or using low band gap materials such as InAs [11,12]. To create uniform doping and form abrupt junction are another challenges associated with TFET, which is faced by fabrication engineer [13,14].…”