Droplet target for low-debris laser-plasma soft X-ray generation

Rymell, L.; Hertz, Hans M.

doi:10.1016/0030-4018(93)90651-k

Cited by 135 publications

(53 citation statements)

References 15 publications

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“…EUV metrology growth should keep up with the development of other EUV technologies. To address these problems, debris-free sources and droplet mitigation systems are under construction for EUV metrology purposes [5][6][7][8][9][10][11][12][13]. Nevertheless, much work remains to be done in this field.…”

Section: Introductionmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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The paper describes a debris-free, efficient laserproduced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its properties and spectroscopic signatures are characterized and discussed. The spatio-spectral features of the EUV emission are investigated. We show a large body of results related to the intensity and brightness of the EUV emission, its spatial, temporal, and angular behavior and the effect of the repetition rate as well. A conversion efficiency of laser energy into EUV in-band energy at 13.5 nm of 0.42% has been gained. The electron temperature and electron density of the source were estimated by means of a novel method using the FLY code. The experimental data and the Hullac code calculations are compared and discussed. The source is well suited for EUV metrology purposes. The potential of the source for R. Rakowski ( ) ·

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Section: Introductionmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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“…Many of the above mentioned advantages are also true for liquid targets. 19,20 However, few experiments using short laser pulses ͑Ͻ1 ps͒ to produce x-ray emitting plasmas from liquid targets have been carried out 21 and the temporal structure of the emission has yet to be studied.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of laser-irradiated Ar clusters as a source for time-resolved x-ray studies

Larsson

Sjögren

1999

Review of Scientific Instruments

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We have measured the absolute average photon flux, the spectral characteristics, and the time structure of x rays emitted from Ar clusters which were irradiated by a 100 fs laser with an intensity of 10 17 W/cm 2 . The measured photon flux was 10 7 photons per shot in the K ␣ ͑at 3 keV͒ line in a 4 sr solid angle. The temporal structure was measured using a streak camera with a 10 ps time resolution. It was found that less than 1% of the photons were emitted within the 10 ps time-response function of the streak camera. The emission profile is roughly exponential with a time constant of 3 ns.

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“…The choice in target material involves a different emission spectrum; in contrast to the Kr gas target, the liquid methanol jet emits a line spectrum, which is ideally suited for x-ray microscopy. The plasma has a high spatial stability (25 µm at FWHM) [157] and a narrow spectral bandwidth of ∆λ λ = 2 × 10 −3 at λ = 3.37 nm (= 368 eV). A detailed description of the cTXM is found in Takman et al [191], Hertz et al [74] and Bertilson [21].…”

Section: Compact Transmission X-ray Microscopementioning

confidence: 99%

Soft x-ray spectromicroscopy of environmental and biological samples

Sedlmair¹

2011

Göttingen Series in X-Ray Physics

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Droplet target for low-debris laser-plasma soft X-ray generation

Cited by 135 publications

References 15 publications

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Evaluation of laser-irradiated Ar clusters as a source for time-resolved x-ray studies

Soft x-ray spectromicroscopy of environmental and biological samples

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