2013
DOI: 10.1016/j.vacuum.2012.11.009
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Dry etching properties of TiO2 thin films in O2/CF4/Ar plasma

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Cited by 30 publications
(12 citation statements)
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“…This high refractive index will pull field distribution move to PhCs and thus obtain a high PhC confinement factor. Besides, TiO 2 is a widely available material with compatible growth properties and can be easily fabricated as micro-nano structures, such as gratings and photonic crystals [31][32][33][34][35]. Different lattice constants and hole radius designs have the function of realizing different wavelength mode lasing, as illustrated in Figure 3.…”
Section: Resultsmentioning
confidence: 99%
“…This high refractive index will pull field distribution move to PhCs and thus obtain a high PhC confinement factor. Besides, TiO 2 is a widely available material with compatible growth properties and can be easily fabricated as micro-nano structures, such as gratings and photonic crystals [31][32][33][34][35]. Different lattice constants and hole radius designs have the function of realizing different wavelength mode lasing, as illustrated in Figure 3.…”
Section: Resultsmentioning
confidence: 99%
“…Unlike Al 2 O 3 , TiO 2 is etched by fluorine chemistry. Based on the work of Choi et al, 38 a CF 4 -O 2 -based process has been developed resulting in a TiO 2 etch rate of ≈ 1.5 nm/s and a TiO 2 over Al 2 O 3 selectivity of ≈ 29. Hence, the top hard mask layer was sufficiently thick.…”
Section: Sample Fabrication Schemementioning
confidence: 99%
“…The etching of TiO 2 structures via plasma has been widely discussed in literature. 33,34 We tested two different gases: CF 4 and SF 6 . Preliminary experiments were performed using a photoresist mask patterned on the micron-scale to identify the parameters suitable for the etching of our TiO 2 membranes deposited by e-beam evaporation at room temperature.…”
Section: Dependence Of the Tio 2 Phase And Refractive Index On The Famentioning
confidence: 99%