Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions

Abstract

The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF-SIMS instrument. The sample under investigation was a multilayer sample consisting of Irganox 3114 embedded in a Irganox 1010 matrix provided by NPL. C 60 sputter beam energies between 10 and 30 keV, and angles of 45• and 75• were used. The results are discussed with respect to depth resolution, constancy of the sputter rate and quantification possibilities.

Molecular depth profiling of model biological films using low energy monoatomic ions

“…These solutions include, among others, rotation of the sample during depth profiling, optimization of the projectiles energy and bombardment angle, and cooling of the sample [21][22][23][24][25]. Recent results have also demonstrated the high potential of large argon cluster ion beams for molecular depth profiling of organic materials, including crosslinking polymers such as polystyrene and polycarbonate [26].…”

Molecular Depth Profiling with Cluster Ion Beams

“…102 The same applies for organic depth profiling. 11,17,85,103,104 When revisiting Figure 5.24b, for example, the FWHM obtained when employing sample rotation is represented ( ). When comparing this to the values obtained without sample rotation (•), one can clearly see the improvement in the depth resolution, particularly at greater erosion depths, where the sample topography really starts accumulating under normal sputtering conditions.…”

“…The effects of beam energy and sample rotation employed simultaneously were also examined by Rading et al, 104 where it was found that samples analyzed at lower beam energies with sample rotation provide further improvements in the depth resolution as compared to higher beam energies with sample rotation.…”

Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+–Ar+ cosputtering

“…There are several important variables, such as the ion beam incidence angle [31,32], sample rotation [33,34], sample temperature [33,35], ambient environment [36], and cosputtering with other ion beams [34,37], that could improve these problems and further expand the applications of C 60 + by varying these experimental parameters. Polymethylmethacrylate (PMMA) is a transparent and thermoplastic material.…”