2020
DOI: 10.1088/1361-6595/ab8686
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Dual frequency DBD: influence of the amplitude and the frequency of applied voltages on glow, Townsend and radiofrequency DBDs

Abstract: To study dual frequency Townsend glow and radio frequency DBDs in an Ar/NH3 Penning mixture, different voltages are applied on each electrode of a plane/plane DBD. The one which has the higher amplitude and frequency, V H, determines the discharge regime. The other one, which has a lower amplitude and frequency, V L, is more similar to a bias voltage. V H frequency ranges from 50 kHz to 13.56 MHz and V L frequency from 1 kHz to 2 MHz. The … Show more

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Cited by 16 publications
(13 citation statements)
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References 37 publications
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“…As said previously, even if only 3% of Ar(1s) consumption are involved in Penning ionization, this reaction remains necessary for the discharge ignition. If Penning ionization is entirely removed from the revised model, the discharge no longer ignites, which fully supports previous experimental findings demonstrating the importance of the NH3 Penning gas mixture in the physics driving Ar-based, low-frequency DBDs [18,23].…”
Section: Discharge Kineticssupporting
confidence: 85%
“…As said previously, even if only 3% of Ar(1s) consumption are involved in Penning ionization, this reaction remains necessary for the discharge ignition. If Penning ionization is entirely removed from the revised model, the discharge no longer ignites, which fully supports previous experimental findings demonstrating the importance of the NH3 Penning gas mixture in the physics driving Ar-based, low-frequency DBDs [18,23].…”
Section: Discharge Kineticssupporting
confidence: 85%
“…According to the ionization mechanism of Townsend, when a high voltage alternating current is applied between two electrodes, the strong electric field will accelerate the collision between the electrons and the neutral gas particles near the electrodes [21]. The variation of the power supply frequency will change the collision frequency (referring to the non-isotropic collision frequency affected by the applied electric field) and the free stroke of the electrons.…”
Section: The Influence Of Power Frequency On Nox Removal Efficiencymentioning
confidence: 99%
“…This particular APPJ design has the key role of obtaining high ion and electron density plasma at low temperature, leading to high deposition efficiency even on dielectric substrates and allowing at the same time to maintain the precursors' chemical functionalities (24,25). The RF power source has the main role of controlling the plasma density, while the HV is needed to improve the stability and the plasma interaction with the substrate and to avoid the transition to RF γ-mode, where localized effects start to dominate and form hot filamentous plasma instead of a cold uniform plasma flame (26). N2 was used as a cooling and a shielding gas and confined around the plasma flame by the addition of a nozzle cap (Fig.…”
Section: Design Of Plasma Polymerization-capable Appj For Ammentioning
confidence: 99%