Duo-Plasmaline — a linearly extended homogeneous low pressure plasma source

Petasch, W.; Räuchle, E.; Muegge, H.; Muegge, K.

doi:10.1016/s0257-8972(97)00015-7

Cited by 62 publications

(32 citation statements)

References 4 publications

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“…This cold gas plasma is composed of several species like negative and positive ions, free radical molecules, electron, UV-photons and ozone (Terrier et al 2009). Duo-Plasmaline is a linearly extended plasma source excited using microwaves of 2.45 GHz at a pressure <1000 Pa (Petasch et al 1997) and several other plasma treatment systems have evolved based on this principle. The Plasmodul is a microwave sustained low pressure plasma reactor with a modular concept based on the Duo-Plasmaline principle which provides an easy upscaling for industrial applications (Schulz et al).…”

Section: Plasma Sourcesmentioning

confidence: 99%

“…The Plasmodul is a microwave sustained low pressure plasma reactor with a modular concept based on the Duo-Plasmaline principle which provides an easy upscaling for industrial applications (Schulz et al). This type of microwave excited plasma sources are well suited for large area plasma treatment (Petasch et al 1997) and can probably be employed for surface treatment of foods or processing surfaces at industrial scale. More recently, Kim et al (2010) Specific treatment times for targeted spore or bacterial reductions are dependent on product loading, packaging material, gas composition and package/electrode configuration.…”

Section: Plasma Sourcesmentioning

confidence: 99%

See 1 more Smart Citation

Nonthermal Plasma Inactivation of Food-Borne Pathogens

Misra¹,

Tiwari

Raghavarao³

et al. 2011

Food Eng Rev

504

276

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Non-thermal plasma (NTP) is electrically energized matter, composed of highly reactive species including gas molecules, charged particles in the form of positive ions, negative ions, free radicals, electrons and quanta of electromagnetic radiation (photons) at near-room temperature. NTP is an emerging nonthermal technology with potential applications for decontamination in the food industries. An upsurge in the research activities for plasma based inactivation of food borne pathogens is evident in the recent years. These studies have shown that NTP can be used for the surface decontamination of raw produce, dried nuts and the packaging materials etc. This paper reviews the action of plasma agents on the microbial classes and describes proven and potential applications in food processing. Novel developments in the technology and a future outlook for the application to foods are discussed.

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Section: Plasma Sourcesmentioning

confidence: 99%

Section: Plasma Sourcesmentioning

confidence: 99%

Nonthermal Plasma Inactivation of Food-Borne Pathogens

Misra¹,

Tiwari

Raghavarao³

et al. 2011

Food Eng Rev

504

276

View full text Add to dashboard Cite

show abstract

“…In the axial direction the plasma is confined due to shielding of the EM waves by the plasma. 47,48 This shielding occurs for plasma densities larger than the critical density n c . For microwaves with the frequency of 2Á45 GHz the critical density is n c ¼ 7Á45 Â 10 10 cm À 3 and this shielding condition is easily met for the MW powers applied in this source.…”

Section: The Linear Microwave Plasma Sourcementioning

confidence: 99%

Bulk and surface passivation of silicon solar cells accomplished by silicon nitride deposited on industrial scale by microwave PECVD

Soppe

Rieffe

Weeber

2005

Prog. Photovolt: Res. Appl.

135

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Bulk and surface passivation by silicon nitride has become an indispensable element in industrial production of multicrystalline silicon (mc-Si) solar cells. Microwave PECVD is a very effective method for high-throughput deposition of silicon nitride layers with the required properties for bulk and surface passivation. In this paper an analysis is presented of the relation between deposition parameters of microwave PECVD and material properties of silicon nitride. By tuning the process conditions (substrate temperature, gas flows, working pressure) we have been able to fabricate silicon nitride layers which fulfill almost ideally the four major requirements for mcSi solar cells: (1) good anti-reflection coating (refractive index tunable between 2Á0 and 2Á3); (2) good surface passivation on p-type FZ wafers (S eff < 30 cm/s); (3) good bulk passivation (improvement of IQE at 1000 nm by 30% after short thermal anneal); (4) long-term stability (no observable degradation after several years of exposure to sunlight). By implementing this silicon nitride deposition in an inline production process of mc-Si solar cells we have been able to produce cells with an efficiency of 16Á5%.Finally, we established that the continuous deposition process could be maintained for at least 20 h without interruption for maintenance. On this timescale we did not observe any significant changes in layer properties or cell properties. This shows the robustness of microwave PECVD for industrial production.

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“…The plasma source, which consists of an array of four Duo-Plasmalines [3], is embedded into the two gas inlets. With the frequency of 2.45 GHz fed in the Duo-Plasmalines, this leads to a remote microwave plasma deposition process.…”

Section: Methodsmentioning

confidence: 99%

Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation

Ramisch

Mutzke

Schneider

et al. 2013

Nuclear Instruments and Methods in Physics Research Section B:

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For the specific manipulation of barrier-layer properties, a detailed analysis of the layer-growth mechanisms in microwave-PECVD was carried out for Si-wafers with a trench structure as "model cavities" in the µm range. The deposition of a-Si:H (hydrogenated amorphous silicon) layers in pure monosilane plasmas was used as model system to compare experimental results and simulations using the 2D binary collision code SDTrimSP-2D, which showed very good agreement with the experiment. Without bias the layer tends to close above the cavities from both sides, but cracks remain at the closure positions. By biasing the substrate a smoothing of the layer edges above the cavities occurred. Thus, the cavities remained open for a longer time and a more homogeneous coating of the notches is obtained.

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Duo-Plasmaline — a linearly extended homogeneous low pressure plasma source

Cited by 62 publications

References 4 publications

Nonthermal Plasma Inactivation of Food-Borne Pathogens

Nonthermal Plasma Inactivation of Food-Borne Pathogens

Bulk and surface passivation of silicon solar cells accomplished by silicon nitride deposited on industrial scale by microwave PECVD

Mechanisms of layer growth in microwave-PECVD silan plasmas – Experiment and simulation

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