2013 International Conference on Quality, Reliability, Risk, Maintenance, and Safety Engineering (QR2MSE) 2013
DOI: 10.1109/qr2mse.2013.6625639
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Dynamic error analysis for six degrees of freedom micro-displacement mechanism in reticle stage of lithography machine

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“…The kinematic chain and homogeneous coordinate array approaches have been utilized in modeling the errors in lithography machines. For example, the lithography machine has been designed and optimized in [17] through an error analysis model for the 6-DOF of the reticle stage.…”
Section: Existing Literaturementioning
confidence: 99%
“…The kinematic chain and homogeneous coordinate array approaches have been utilized in modeling the errors in lithography machines. For example, the lithography machine has been designed and optimized in [17] through an error analysis model for the 6-DOF of the reticle stage.…”
Section: Existing Literaturementioning
confidence: 99%
“…Briot considered the effects of errors, conducted a detailed theoretical analysis of the 3T1R parallel manipulator, and established the maximum position and maximum orientation error model [6]. Luo established the dynamic error model of a 6-DOF parallel micromanipulator and studied the dynamic accuracy reliability of the mechanism by the Monte Carlo method [7]. Li studied the kinematic accuracy reliability of a 3-DOF 3-PRR parallel manipulator based on the PZT vibration control system.…”
Section: Introductionmentioning
confidence: 99%