Dynamic RON Degradation Suppression by Gate Field Plate in Partially Recessed AlGaN/GaN Metal–Insulator–Semiconductor High‐Electron‐Mobility Transistors
Ye Liang,
Xiuyuan He,
Xi Feng
et al.
Abstract:This study investigates the impact of gate field plate (G‐FP) lengths on the dynamic on‐resistance degradation in partially recessed‐gate D‐mode GaN metal–insulator–semiconductor high‐electron‐mobility transistors (MIS‐HEMTs). Devices with G‐FPs of varying lengths are fabricated, and their electrical characteristics are evaluated. It is found that G‐FPs effectively reduce electron trapping and suppress the dynamic on‐resistance degradation, leading to improved device performance. The study provides design sugg… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.