Dynamic mode optimization for the deposition of homogeneous TiO2 thin film by atmospheric pressure PECVD using a microwave plasma torch

Perraudeau, Amelie; Dublanche-Tixier, Christelle; Tristant, Pascal; Chazelas, Christophe

doi:10.1016/j.apsusc.2019.07.057

Cited by 13 publications

(16 citation statements)

References 31 publications

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“…DSSCs fabricated with these nanostructures revealed exceptional efficiency because of the high surface area of the nanostructures, with a much lower film thickness compared to those reported in previous studies [50]. An experimental study carried out in 2019 used PECVD combined with APPJ technology to elucidate the potential growth mechanisms of TiO 2 thin films deposited over areas of several square centimeters [91]. In this study, the substrate's ability to move allowed the column growth mechanism to be controlled in two modes: static and dynamic.…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 95%

“…Therefore, the authors concluded that the cauliflower-like structures were grown from deposited TiO 2 particles produced by the titanium and oxygen reactive species that formed and collided with each other along the plasma jet [89]. An experimental study carried out in 2019 used PECVD combined with APPJ technology to elucidate the potential growth mechanisms of TiO2 thin films deposited over areas of several square centimeters [91]. In this study, the substrate's ability to move allowed the column growth mechanism to be controlled in two modes: static and dynamic.…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

“…In this study, the substrate's ability to move allowed the column growth mechanism to be controlled in two modes: static and dynamic. The authors showed that, in contrast to static deposition, the movement of the substrate and a fast precursor flow led to the cauliflower-like morphology, while a low precursor flow promoted surface reactions and led to columnar TiO 2 anatase thin films [91].…”

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

“…Finally, the last method for TiO 2 plasma deposition described in this review is APP ignited based on DBD, including atmospheric filamentary discharge [107], diffuse coplanar discharge [108], and APPJ, for which the term "torch" is used sometimes rather than "jet". Moreover, a combination of two methods, e.g., APPJ with CVD [90,91,109], can be used to synthesize and/or treat materials.…”

Section: Atmospheric Pressure Dielectric Barrier Discharge Depositionmentioning

confidence: 99%

“…An experimental study carried out in 2019 used PECVD combined with APPJ technology to elucidate the potential growth mechanisms of TiO 2 thin films deposited over areas of several square centimeters [ 91 ]. In this study, the substrate’s ability to move allowed the column growth mechanism to be controlled in two modes: static and dynamic.…”

Section: Atmospheric Pressure Plasma-enhanced Deposition Of Tio mentioning

confidence: 99%

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Atmospheric Pressure Plasma Deposition of TiO2: A Review

et al. 2020

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Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

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Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 95%

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

Section: Plasma-enhanced Chemical Vapor Depositionmentioning

confidence: 99%

Section: Atmospheric Pressure Dielectric Barrier Discharge Depositionmentioning

confidence: 99%

Section: Atmospheric Pressure Plasma-enhanced Deposition Of Tio mentioning

confidence: 99%

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Atmospheric Pressure Plasma Deposition of TiO2: A Review

et al. 2020

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Hydrophobic glass and paper coatings based on plasma polymerized vegetable oils using a novel atmospheric pressure plasma concept

Bellmann,

Loesch‐Zhang,

Möck

et al. 2024

Plasma Processes & Polymers

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Atmospheric pressure plasma polymerization represents a promising coating technology, addressing drawbacks of traditional processes (solvent use, multistep procedures, etc.) while enabling deposition of thin cross‐linked polymer layers with high contour fidelity. We address technological challenges with a novel plasma device that integrates multiple plasma source benefits and investigate the suitability of two plant‐based precursors, chia and tung oil, for plasma polymerization to hydrophobize glass and paper. Chia oil enables the deposition of thin, covalently bonded hydrophobic polymer layers. Such coatings have diverse applications especially inside the paper industry, where water repellents in the form of internal and surface sizing have always been an essential functionalization step. Using bio‐based precursors and reducing extra chemicals contributes to substituting fossil‐based or harmful substances.

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Advances in Microwave‐Enhanced Chemical Vapor Deposition for Graphene Synthesis

et al. 2022

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Graphene has received intensive research interest in various areas due to its outstanding mechanical, electrical properties, high specific surface area and 2D flexible structure. Mechanical exfoliation generates defect-free graphene, but suffers from ultra-low yield. This drawback can be partially overcome by chemical vapor deposition method (CVD). However, conventional CVD imposes high temperature. In recent years, microwave plasma-enhanced CVD (MPCVD) has been widely investigated as a viable strategy toward large-area graphene synthesis. In this review, important issues during the process are summarized. Firstly, various MPCVD devices that have been explored for graphene synthesis are presented. Secondly, effect of carbon sources, nitrogen-containing gases, and CO 2 in the precursors are discussed. Thirdly, MPCVD enabled direct synthesis of graphene on metal substrates and non-metal sustrates is discussed. Finally, the advances of MPCVD in lowering the graphene synthesis temperature are demonstrated.

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Dynamic mode optimization for the deposition of homogeneous TiO2 thin film by atmospheric pressure PECVD using a microwave plasma torch

Cited by 13 publications

References 31 publications

Atmospheric Pressure Plasma Deposition of TiO2: A Review

Atmospheric Pressure Plasma Deposition of TiO2: A Review

Hydrophobic glass and paper coatings based on plasma polymerized vegetable oils using a novel atmospheric pressure plasma concept

Advances in Microwave‐Enhanced Chemical Vapor Deposition for Graphene Synthesis

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