Early stages of iron anodic oxidation: Defective growth and density increase of oxide layer

Fujii, Hiromasa; Wakabayashi, Yusuke; Doi, Takashi

doi:10.1103/physrevmaterials.4.033401

Cited by 2 publications

(1 citation statement)

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“…A dynamically bent sample was introduced with an in situ measurement of rapid heating of the sample (Liu et al, 2017). Another approach has been published whereby the sample had a certain roughness that allowed one to acquire reflectivity at multiple angles simultaneously; however, this severely limited the choice of substrate (Fujii et al, 2020).…”

Section: Introductionmentioning

confidence: 99%

Millisecond X-ray reflectometry and neural network analysis: unveiling fast processes in spin coating

Schumi-Mareček,

Bertram,

Mikulík

et al. 2024

J Appl Crystallogr

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X-ray reflectometry (XRR) is a powerful tool for probing the structural characteristics of nanoscale films and layered structures, which is an important field of nanotechnology and is often used in semiconductor and optics manufacturing. This study introduces a novel approach for conducting quantitative high-resolution millisecond monochromatic XRR measurements. This is an order of magnitude faster than in previously published work. Quick XRR (qXRR) enables real time and in situ monitoring of nanoscale processes such as thin film formation during spin coating. A record qXRR acquisition time of 1.4 ms is demonstrated for a static gold thin film on a silicon sample. As a second example of this novel approach, dynamic in situ measurements are performed during PMMA spin coating onto silicon wafers and fast fitting of XRR curves using machine learning is demonstrated. This investigation primarily focuses on the evolution of film structure and surface morphology, resolving for the first time with qXRR the initial film thinning via mass transport and also shedding light on later thinning via solvent evaporation. This innovative millisecond qXRR technique is of significance for in situ studies of thin film deposition. It addresses the challenge of following intrinsically fast processes, such as thin film growth of high deposition rate or spin coating. Beyond thin film growth processes, millisecond XRR has implications for resolving fast structural changes such as photostriction or diffusion processes.

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Section: Introductionmentioning

confidence: 99%