2006
DOI: 10.1002/smll.200500370
|View full text |Cite
|
Sign up to set email alerts
|

Easy Writing of Nanopatterns on a Polymer Film Using Electrostatic Nanolithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
25
0

Year Published

2008
2008
2014
2014

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 19 publications
(25 citation statements)
references
References 37 publications
0
25
0
Order By: Relevance
“…They also studied the stability of patterned after several days by AFM imaging and confirmed the pattern remains same as fabricated. Jagadeesan et al [14] have shown some interesting result as at À7 V both raised and grooved patters can be obtained but the reason is not clearly stated.…”
Section: Electrical Methods -Tip Based and Parallel Oxidationmentioning
confidence: 90%
See 3 more Smart Citations
“…They also studied the stability of patterned after several days by AFM imaging and confirmed the pattern remains same as fabricated. Jagadeesan et al [14] have shown some interesting result as at À7 V both raised and grooved patters can be obtained but the reason is not clearly stated.…”
Section: Electrical Methods -Tip Based and Parallel Oxidationmentioning
confidence: 90%
“…2. Raised and grooved patterns due to ramping the tip to different voltage [14]. and it is easy to maintain the relative humidity around 60-70%.…”
Section: Electrical Methods -Tip Based and Parallel Oxidationmentioning
confidence: 99%
See 2 more Smart Citations
“…[13] Block copolymers [14][15][16][17][18][19][20][21] or mixtures of polymers [9,22] have been used as starting materials for the generation of nanopatterned and nanotopography controlled surfaces, to withstand environmental changes such as temperature, solvents, reactive chemical etching, absorption, etc. The nanotechniques for manufacturing nanopattern and nanotopography range from extremely simple ones such as rubbing the substrate [23] or Langmuir-Blodgett films, [24] up to modified AFM (electrostatic nanolithography [25] ) or TEM (carbothermal reduction) [26] analytical instrument operation. Self-assembling nanotechniques [27][28][29][30] are used to generate masks for selective processing of the surface (e.g., etching) or in the direct generation of nanotopography-containing substrates.…”
Section: Introductionmentioning
confidence: 99%