Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu

Meng, Ni; Zhang, Xianglong; Xie, Shunfan; Li, Xianghui; Nie, Shenao; Qiu, Yuxuan; Wei, Ying; Li, Junfeng; Meng, Ruhao; He, Yangang

doi:10.1016/j.surfin.2024.103969

Surfaces and Interfaces

2024

DOI: 10.1016/j.surfin.2024.103969

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Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu

Ni Meng,

Xianglong Zhang,

Shunfan Xie

et al.

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Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu

Cited by 4 publications

References 31 publications

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