In flip chip technology, Al/Ni(V)/Cu under-bump metallization (UBM) is currently applicable for Pb-free solder, and Sn-Ag-Cu solder is a promising candidate to replace the conventional Sn-Pb solder. In this study, Sn-3.0Ag-(0.5 or 1.5)Cu solder bumps with Al/Ni(V)/Cu UBM after assembly and aging at 150°C were employed to investigate the elemental redistribution and reaction mechanism between solders and UBMs. During assembly, the Cu layer in the Sn-3.0Ag-0.5Cu joint was completely dissolved into solders, while Ni(V) layer was dissolved and reacted with solders to form (Cu 1Ày ,Ni y ) 6 Sn 5 intermetallic compound (IMC). The (Cu 1Ày ,Ni y ) 6 Sn 5 IMC gradually grew with the rate constant of 4.63 3 10 À8 cm/sec 0.5 before 500 h aging had passed. After 500 h aging, the (Cu 1Ày ,Ni y ) 6 Sn 5 IMC dissolved with aging time. In contrast, for the Sn-3.0Ag-1.5Cu joint, only fractions of Cu layer were dissolved during assembly, and the remaining Cu layer reacted with solders to form Cu 6 Sn 5 IMC. It was revealed that Ni in the Ni(V) layer was incorporated into the Cu 6 Sn 5 IMC through slow solid-state diffusion, with most of the Ni(V) layer preserved. During the period of 2,000 h aging, the growth rate constant of (Cu 1Ày ,Ni y ) 6 Sn 5 IMC was down to 1.74 3 10 À8 cm/sec 0.5 in the Sn-3.0Ag-1.5Cu joints. On the basis of metallurgical interaction, IMC morphology evolution, growth behavior of IMC, and Sn-Ag-Cu ternary isotherm, the interfacial reaction mechanism between Sn-3.0Ag-(0.5 or 1.5)Cu solder bump and Al/Ni(V)/Cu UBM was discussed and proposed.