The
core-level energy shifts observed using X-ray photoelectron
spectroscopy (XPS) have been used to determine the band bending at
Si(111) surfaces terminated with Si–Br, Si–H, and Si–CH3 groups, respectively. The surface termination influenced
the band bending, with the Si 2p3/2 binding energy affected
more by the surface chemistry than by the dopant type. The highest
binding energies were measured on Si(111)–Br (whose Fermi level
was positioned near the conduction band at the surface), followed
by Si(111)–H, followed by Si(111)–CH3 (whose
Fermi level was positioned near midgap at the surface). Si(111)–CH3 surfaces exposed to Br2(g) yielded the lowest
binding energies, with the Fermi level positioned between midgap and
the valence band. The Fermi level position of Br2(g)-exposed
Si(111)–CH3 was consistent with the presence of
negatively charged bromine-containing ions on such surfaces. The binding
energies of all of the species detected on the surface (C, O, Br)
shifted with the band bending, illustrating the importance of isolating
the effects of band bending when measuring chemical shifts on semiconductor
surfaces. The influence of band bending was confirmed by surface photovoltage
(SPV) measurements, which showed that the core levels shifted toward
their flat-band values upon illumination. Where applicable, the contribution
from the X-ray source to the SPV was isolated and quantified. Work
functions were measured by ultraviolet photoelectron spectroscopy
(UPS), allowing for calculation of the sign and magnitude of the surface
dipole in such systems. The values of the surface dipoles were in
good agreement with previous measurements as well as with electronegativity
considerations. The binding energies of the adventitious carbon signals
were affected by band bending as well as by the surface dipole. A
model of band bending in which charged surface states are located
exterior to the surface dipole is consistent with the XPS and UPS
behavior of the chemically functionalized Si(111) surfaces investigated
herein.