Effect of Al Polishing Conditions on the Growth and Morphology of Porous Anodic Alumina Films

Abstract

The conditions applied during the electrochemical polishing of aluminum were found to be important parameters for the successive formation of nanoporous alumina films. First, a high-purity Al foil was electrochemically polished in an aqueous solution containing C2H5OH and HClO4 at various sets of conditions, such as applied potential (5–35 V), temperature (0–20 °C), and process duration (10–180 s). Extensive studies of the topography of Al after polishing by scanning electron microscopy and atomic force microscopy allow verification of the correlations between conditions applied during the substrate pretreatment and dimensions of the nanopatterns generated on the metal surface. Next, Al polished samples at two different sets of conditions were used as starting materials for anodization. Unpolished Al samples were also anodized for reference. It was confirmed that electropolishing conditions do not significantly affect the oxide growth rate during anodization and the efficiency of anodic film formation. On the contrary, it was proved that the dimensions of the surface texture formed during Al polishing significantly affect the morphology and pore order within the anodic film. Therefore, it can be stated that it is possible to tune to some extent the arrangement of nanochannels within anodic aluminum oxide films by simply changing conditions during the electropolishing procedure..