Effect of amorphous silicon interlayer on the adherence of amorphous hydrogenated carbon coatings deposited on several metallic surfaces

Capote, Gil; Lugo, D.C.; Gutierrez, J Millan; Mastrapa, Gil C; Trava-Airoldi, V.J.

doi:10.1016/j.surfcoat.2018.03.093

Cited by 29 publications

(7 citation statements)

References 39 publications

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“…The adherence of the a-C:H and a-C:H(N) films deposited on the metal surface were measured according the VDI 3198 Indentation Test Evaluation Standard [38] by Rockwell C in a Mitutoyo -HR 300 Digital equipment conducted considering the ASTM E2546-15 standard [36]. The qualitative analyzes were carried out in the indentation area by SEM, and the quantitative analyzes were carried out by ImageJ software, comparing the total analyzed area with the delaminated region [39]. Table 1 presents the visual analysis results of all a-C:H films studied, observing that the parameters used to produce the a-C:H-30_70/30, a-C:H-30_90/10, a-C:H-40_70/30, a-C:H-40_90/10, a-C:H-500 V and a-C:H-600 V, with previous deposition of amorphous silicon interface, was adequate to form a uniform and good adhesion film on the substrate.…”

Section: Characterizationmentioning

confidence: 99%

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Almeida

Souza

Costa

et al. 2020

Mater. Res. Express

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The great interest in the study of diamond-like carbon films (a-C:H) is justified by its mechanical and tribological properties. However, the high internal stress of the film results in its difficult adhesion to the metallic substrate, which can be solved by nitrogen incorporation in the a-C:H film, allowing a formed film of lower internal stress. The objective of this work is to evaluate the influence of flow (20, 30 and 40sccm), CH 4 /Ar ratio (90/10 and 70/30) and voltage (400, 500, 600 and 700 V) in the a-C:H formation. For the best condition of the film, we studied the effect of nitrogen incorporation in the hardness and wear resistance of the a-C:H(N), modifying the nitrogen percentage in the treatment at 10% to 60% N 2 . The treatments were carried out in the Ti 6 Al 4 V substrate by DC-PECVD for two hours. For good adhesion of the films on the substrate, a silicon interlayer must be produced. The increase in the voltage above 600 V increases the I D /I G and film thickness, causing its delamination, and the gas ratio did not influence the a-C:H characteristics. The a-C:H film deposited with 30 sccm, 90/10 and 500 V was characterized as a-C:H (hard), with properties such as the hardness of 17 GPa, 30% H, 39% sp 3 and I D /I G ratio of 0.58. Since nitrogen reduced the deposition rate, the total gas flow for the production of a-C:H(N) was performed with 40 sccm. The Raman spectra of a-C:H(N) films showed changes in D band intensity and displacement in relation to the nitrogen-free film spectrum, evidencing the incorporation of nitrogen in the film. The XPS analysis showed the linear increase of the nitrogen incorporation in the a-C:H(N) film with the increase of the amount of the N 2 gas in the treatment, which caused, in general, a decrease in the amount of C-C sp 3 bonding, increasing the adhesion of the film in the substrate and not necessarily the low wear resistance of the formed film.According to Robertson [4] the DLC film that presents hydrogen concentrations between 30 and 50% receives the nomenclature of hydrogenated amorphous carbon (a-C:H), and presents lower hardness and internal stress than ta-C, facilitating the adhesion process of the film in the metallic substrates. This occurs due to sp 2 bonds formed in detriment of sp 3 bonds.The DLC films have been used in a variety of applications due to their notable properties, as protective coatings against wear and corrosion, in optical windows (optical filters), data storage hard drives, high performance automotive parts, coatings for biomedical products and electromechanical microdevices [9][10][11][12].However, as reported by Chen et al [13] and confirmed by Cemin et al [11], the high intrinsic compressive stress of the film, the high variation of the elastic coefficient, the difference in thermal expansion and the low chemical affinity between DLC and substrate difficult the adhesion process of the DLC film mainly when deposited on metallic surfaces. Thus, the use of techniques as oxide layer removal and the use of film interlayer previously to ...

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Section: Characterizationmentioning

confidence: 99%

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Almeida

Souza

Costa

et al. 2020

Mater. Res. Express

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“…49) Coating with DLC thin films possessing such properties, can extend the service life, and applications include tribology and aerospace. 10,11) DLC films are a type of amorphous carbon material with a mixture of sp 3 and sp 2 carbon bonding, the ratio of which influences the properties of the coating, such as the mechanical and optical characteristics. 1214) There are two methods for fabricating DLC films: chemical vapor deposition (CVD) using hydrocarbon gas or other raw materials, and physical vapor deposition (PVD) using solid carbon as a raw material.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the Effect of Hydrogen Gas as Raw Material for DLC Film Preparation

Okada

Nishimoto

2022

Mater. Trans.

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For reducing the frictional losses on the sliding surfaces of mounting parts and improving the wear resistance in order to extend the life of the component, diamond-like carbon (DLC) film coating has been considered, in recent years. However, reduction of the long processing time involved is desirable for mass production. For achieving this, the effect of mixing hydrocarbon gas and hydrogen gas in the deposition process is compared, and the differences in the resulting DLC films are determined in this study. DLC films are deposited on Si wafers through radio frequency plasma chemical vapor deposition (RF-PECVD), with a mixture of methane gas and hydrogen (dilution gas) as the raw material. In addition, DLC films are prepared by mixing acetylene gas with hydrogen gas for comparison, and the effect of the hydrogen gas mixture on the deposition rate, composition, and hardness of the films is confirmed. When hydrogen gas is mixed with methane gas, the deposition rate increases with the increase in the ratio of hydrogen gas in the raw material, and the percentage of sp 3 bonds increases; however, the hardness and elastic modulus decrease. Furthermore, the adhesiveness deteriorates with the increase in the hydrogen gas ratio.

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“…Diamond-like carbon (DLC) coatings are state-of-the-art thin films that have been extensively studied in the last three decades. , Hydrogenated amorphous carbon (a-C:H) thin films are part of a particular subgroup of DLC coatings with hydrogen ranging from 40 to 60% atomic content. , Such films have attracted much attention because of their good properties such as high wear resistance, chemical inertness, high hardness, and ultralow friction, among others characteristics. − Applications of a-C:H thin films lead to energy efficiency and high productivity, reducing friction in engines and wear of cutting tools, respectively. − In addition, a-C:H thin film applications in watches and table cutlery are fashionable and remarkable in view of, plus all the properties cited above because the attractive and brilliant uniform black aspect of the film when deposited in the microscopic order on polished metal surfaces. , …”

Section: Introductionmentioning

confidence: 99%

“…Chemical bonding of silicon-containing interlayers is abundantly reported in the literature. , It is remarked that the affinity of the elements forming the chemical structure of both the outermost (a-C:H/a-SiC x :H) and innermost (a-SiC x :H/ferrous alloy) interfaces determines the final adhesion behavior. Indeed, the innermost interface shows an adequate adhesion since Si–Fe is very stable and the preferential formation of Fe 3 Si (Δ G ° = −78.31 kJ mol –1 (100 °C) to −77.14 kJ mol –1 (500 °C)) instead of Fe 3 C (Δ G ° = +8.51 kJ mol –1 (100 °C) to +3.59 kJ mol –1 (500 °C)) is thermodynamically expected.…”

Section: Introductionmentioning

confidence: 99%

“…Diamond-like carbon (DLC) coatings are state-of-the-art thin films that have been extensively studied in the last three decades. 1,2 Hydrogenated amorphous carbon (a-C:H) thin films are part of a particular subgroup of DLC coatings with hydrogen ranging from 40 to 60% atomic content. 1,3 Such films have attracted much attention because of their good properties such as high wear resistance, chemical inertness, high hardness, and ultralow friction, among others characteristics.…”

Section: Introductionmentioning

confidence: 99%

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Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiC_x:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen

Crespi

Leidens

Antunes

et al. 2019

ACS Appl. Mater. Interfaces

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Hydrogenated amorphous carbon thin films (a-C:H) have attracted much attention because of their surprising properties, including ultralow friction coefficients in specific conditions. Adhesion of a-C:H films on ferrous alloys is poor due to chemical and physical aspects, avoiding a widespread application of such a film. One possibility to overcome this drawback is depositing an interlayeran intermediate thin filmbetween the carbon-based coating and the substrate to improve chemical interaction and adhesion. Based on this, interlayers play a key role on a-C:H thin-film adhesion through a better chemical network structure at the outermost layer of the a-SiC x :H interlayer, i.e., the a-C:H/a-SiC x :H interface. However, despite the latest important advances on the subject, the coating adhesion continues being a cumbersome problem since it depends on multifactorial causes. Thus, the purpose of this paper is to report a standard protocol leading to surprising good results based on the control of the interfacial chemical bonding by properly biasing the substrate (between 500 and 800 V) during the a-SiC x :H interlayer deposition at an appropriate low temperature, by using hexamethyldisiloxane as precursor. The interlayers and the outermost interfaces were analyzed by a comprehensive set of techniques, including X-ray photoelectron spectroscopy, glow discharge optical emission spectroscopy, and Fourier transform infrared spectroscopy. Nanoscratch tests, complemented by scanning electron microscopy and energy-dispersive X-ray spectroscopy, were used to evaluate the critical load for delamination to certify and quantify the adhesion improvement. This study was important to identify the chemical local bonding of the elements at the interface and its local environment, including the in-depth chemical composition profile of the coating. An important effect is that the oxygen content decreases on increasing substrate bias voltage, improving the adhesion of the film. This is due to the fact that energetic ion hitting the growing interlayer breaks Si–O and C–O bonds, augmenting the content of Si–C and C–C bonds at the outermost interface of the a-SiC x :H interlayer and enhancing the a-C:H coating adhesion. Moreover, the combination of high bias voltage (800 V) and low temperature (150 °C) during the a-SiC x :H interlayer deposition allows good adhesion of a-C:H thin films due to sputtering of light elements like oxygen. Therefore, an appropriated bias and temperature combination can open new pathways in a-C:H thin-film deposition at low temperatures. These results are particularly interesting for temperature-sensible metal alloys, where well-adhered a-C:H thin films are mandatory for tribological applications.

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Effect of amorphous silicon interlayer on the adherence of amorphous hydrogenated carbon coatings deposited on several metallic surfaces

Cited by 29 publications

References 39 publications

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Investigation of the Effect of Hydrogen Gas as Raw Material for DLC Film Preparation

Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiC_x:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen

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Effect of amorphous silicon interlayer on the adherence of amorphous hydrogenated carbon coatings deposited on several metallic surfaces

Cited by 29 publications

References 39 publications

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti6Al4V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti6Al4V substrate

Investigation of the Effect of Hydrogen Gas as Raw Material for DLC Film Preparation

Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiCx:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen

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Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiC_x:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen