2021
DOI: 10.1016/j.surfcoat.2021.127770
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Effect of annealing and irradiation on the evolution of texture and grain boundary interface in electrodeposited nanocrystalline nickel of varying grain sizes

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Cited by 13 publications
(5 citation statements)
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“…In figure 12(f), we also observed that the growth of TBs is substantially facilitated using an initial microstructure with a high fraction of HAGB. Lastly, we discuss the results of the present simulations in comparison to recent experimental observations of TB development in nanocrystalline materials [45]. Julie et al [45] investigated the effect of grain size on texture formation during annealing using electrodeposited nickel samples with different average grain sizes, ranging from 20 nm to 200 nm.…”
Section: Resultsmentioning
confidence: 77%
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“…In figure 12(f), we also observed that the growth of TBs is substantially facilitated using an initial microstructure with a high fraction of HAGB. Lastly, we discuss the results of the present simulations in comparison to recent experimental observations of TB development in nanocrystalline materials [45]. Julie et al [45] investigated the effect of grain size on texture formation during annealing using electrodeposited nickel samples with different average grain sizes, ranging from 20 nm to 200 nm.…”
Section: Resultsmentioning
confidence: 77%
“…Lastly, we discuss the results of the present simulations in comparison to recent experimental observations of TB development in nanocrystalline materials [45]. Julie et al [45] investigated the effect of grain size on texture formation during annealing using electrodeposited nickel samples with different average grain sizes, ranging from 20 nm to 200 nm. It is observed that the fraction of TBs in the final microstructure increases as the average grain size in the initial microstructure decreases.…”
Section: Resultsmentioning
confidence: 77%
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“…As shown in Table 1 , most studied nanocrystalline materials are produced via thin-film deposition: sputter deposition [ 31 , 32 , 72 , 78 , 79 ], pulsed deposition [ 35 , 80 ], electrodeposition [ 34 , 40 ], or gas deposition [ 44 , 45 , 81 ]. Deposited thin films result in high chemical purity materials as they are produced under a clean environment and they typically present columnar grains [ 82 , 83 ].…”
Section: Grain Boundary Character Controlled Through Synthesis and Pr...mentioning
confidence: 99%