Effect of Annealing on the Structural, Magnetic, Surface Energy and Optical Properties of Co32Fe30W38 Films Deposited by Direct-Current Magnetron Sputtering

Liu, Wen-Jen; Chang, Yung‐Huang; Ou, Sin-Liang; Chen, Yuan-Tsung; Li, Wei-Hsuan; Jhou, Tian-Yi; Chu, Chun-Lin; Wu, Te‐Ho; Tseng, Shih-Wen

doi:10.3390/coatings10111028

Cited by 8 publications

(5 citation statements)

References 39 publications

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“…Figure 1a-c demonstrates that the intensity of CoFe (110) peaks increased as the post-annealing temperature increased. According to [23], it was suggested that the crystallization of as-deposited CoFeW films on Si(100) substrate was better than ones on glass substrate.…”

Section: X-ray Diffractionmentioning

confidence: 99%

“…The various thicknesses (t f ) of as-deposited and annealed CoFeW films and, therefore, the effect of crystallinity on the magnetic properties of CoFeW films were also studied. In our previous research, the as-deposited and post-annealing glass/CoFeW were examined for their magnetic and crystallinity properties, as mentioned in Table 1 [23]. In this study, it was found that the thermal stability of Co 40 Fe 40 W 20 was about 350 • C. However, in order to apply a magnetic film in MRAM, the 400 • C of thermal tolerance is required for complementary metal-oxide-semiconductor (CMOS) and back-end-of-line (BEOL) process compatibility [22,24].…”

Section: Introductionmentioning

confidence: 99%

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Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate

et al. 2021

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Co40Fe40W20 monolayers of different thicknesses were deposited on Si(100) substrates by DC magnetron sputtering, with Co40Fe40W20 thicknesses from 10 to 50 nm. Co40Fe40W20 thin films were annealed at three conditions (as-deposited, 250 °C, and 350 °C) for 1 h. The structural and magnetic properties were then examined by X-ray diffraction (XRD), low-frequency alternative-current magnetic susceptibility (χac), and an alternating-gradient magnetometer (AGM). The XRD results showed that the CoFe (110) peak was located at 2θ = 44.6°, but the metal oxide peaks appeared at 2θ = 38.3, 47.6, 54.5, and 56.3°, corresponding to Fe2O3 (320), WO3 (002), Co2O3 (422), and Co2O3 (511), respectively. The saturation magnetization (Ms) was calculated from the slope of the magnetization (M) versus the CoFeW thickness. The Ms values calculated in this manner were 648, 876, 874, and 801 emu/cm3 at the as-deposited condition and post-annealing conditions at 250, 350, and 400 °C, respectively. The maximum MS was about 874 emu/cm3 at a thickness of 50 nm following annealing at 350 °C. It indicated that the MS and the χac values rose as the CoFeW thin films’ thickness increased. Owing to the thermal disturbance, the MS and χac values of CoFeW thin films after annealing at 350 °C were comparatively higher than at other annealing temperatures. More importantly, the Co40Fe40W20 films exhibited a good thermal stability. Therefore, replacing the magnetic layer with a CoFeW film improves thermal stability and is beneficial for electrode and strain gauge applications.

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Section: X-ray Diffractionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate

et al. 2021

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“…The significance of the work is investigating surface roughness in order to study the relationship between surface energy and magnetic-optical properties in CoFeSm thin films of various thicknesses and annealed at different temperatures. Moreover, the outcome of the present study is compared with the magnetic and adhesive characteristics of Cobalt Iron Vanadium (CoFeV), Cobalt Iron Tungsten (CoFeW), and Cobalt Iron Ytterbium (CoFeYb), and Cobalt Iron Yttrium (CoFeY) in Table 1 [15][16][17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

Investigation of Sm Addition on Microstructural and Optical Properties of CoFe Thin Films

Liu,

Chang,

Chiang

et al. 2023

Materials

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CoFe-based alloys and rare earth (RE) elements are among the most studied materials in applying magnetic devices to improve soft magnetic characteristics. A series of Co40Fe40Sm20 films are deposited on a glass substrate via the sputtering technique, followed by an annealing process to investigate their effect on microstructural and optical properties of Co40Fe40Sm20 films. In this study, the increase in the thickness of Co40Fe40Sm20 films and annealing temperatures resulted in a smoother surface morphology. The 40 nm Co40Fe40Sm20 films annealed 300 °C are expected to have good wear resistance and adhesive properties due to their high values of H/E ratio and surface energy. Optical transparency also increased due to the smoother surface of the Co40Fe40Sm20 films.

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“…Table 1 contains the abbreviations and full names of the proper nouns. In earlier studies, the magnetic and adhesion characteristics of CoFeY materials were compared to those of Cobalt Iron Vanadium (CoFeV), Cobalt Iron Tungsten (CoFeW), and Cobalt Iron Ytterbium (CoFeYb) in Table 2 [ 23 , 24 , 25 , 26 , 27 ]. In contrast to previous CoFeY films that were sputtered on Si(100) substrates to study magnetic and adhesion outcomes, the goal of this research is to produce thin films on glass substrates and also investigate optical transmittance properties.…”

Section: Introductionmentioning

confidence: 99%

The Influence of Annealing and Film Thickness on the Specific Properties of Co40Fe40Y20 Films

Liu

Chang

Chiang³

et al. 2023

Materials

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Cobalt Iron Yttrium (CoFeY) magnetic film was made using the sputtering technique in order to investigate the connection between the thickness and annealing procedures. The sample was amorphous as a result of an insufficient thermal driving force according to X-ray diffraction (XRD) examination. The maximum low-frequency alternate-current magnetic susceptibility (χac) values were raised in correlation with the increased thickness and annealing temperatures because the thickness effect and Y addition improved the spin exchange coupling. The best value for a 50 nm film at annealing 300 °C for χac was 0.20. Because electron carriers are less constrained in their conduction at thick film thickness and higher annealing temperatures, the electric resistivity and sheet resistance are lower. At a thickness of 40 nm, the film’s maximum surface energy during annealing at 300 °C was 28.7 mJ/mm2. This study demonstrated the passage of photon signals through the film due to the thickness effect, which reduced transmittance. The best condition was found to be 50 nm with annealing at 300 °C in this investigation due to high χac, strong adhesion, and low resistivity, which can be used in magnetic fields.

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Effect of Annealing on the Structural, Magnetic, Surface Energy and Optical Properties of Co32Fe30W38 Films Deposited by Direct-Current Magnetron Sputtering

Cited by 8 publications

References 39 publications

Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate

Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate

Investigation of Sm Addition on Microstructural and Optical Properties of CoFe Thin Films

The Influence of Annealing and Film Thickness on the Specific Properties of Co40Fe40Y20 Films

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